Substrate Wetting Control During Delayed Supercritical Drying
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Solution Overview
Problem
Existing substrate processing methods face issues with substrate yield reduction due to pattern collapse during drying treatment when transfer to a supercritical treater is delayed, caused by changes in the liquid film on the substrate surface.
Innovation Solution
A method involving continuous or intermittent supply of a processing liquid, such as DIW or IPA, to maintain the substrate surface wet during transfer delays, preventing drying and pattern collapse.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the substrate is transferred from the liquid treater to the supercritical treater with a liquid film formed on the upper surface, then drying treatment is achieved, but if transfer is delayed the liquid film changes causing pattern collapse and yield reduction
Solution Approach 1:
The liquid treater performs preliminary wetting of the substrate upper surface with processing liquid before transfer, creating a protective liquid film that prevents pattern collapse during any transfer delay. This preliminary action ensures the substrate maintains its structural integrity even when transfer to the supercritical treater is delayed.
Solution Approach 2:
The liquid treater continues to supply processing liquid to the substrate upper surface continuously or intermittently during the transfer process and any subsequent delay period. This continuous supply maintains the liquid film state, preventing evaporation and pattern collapse, ensuring the substrate remains in a protected state until supercritical drying begins.
2Reliability
If processing liquid is continuously supplied to maintain substrate wetness during transfer delays, then pattern collapse is prevented, but processing liquid consumption increases
Solution Approach 1:
The liquid treater supplies processing liquid to the substrate upper surface in periodic intervals rather than continuously. The supply operation is performed continuously or intermittently during transfer delays, maintaining the liquid film state while reducing overall liquid consumption compared to continuous supply. This periodic replenishment prevents pattern collapse while being more economical.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Improves substrate yield by preventing pattern collapse and reducing costs through efficient use of processing liquids, even when transfer to the supercritical treater is not immediate.
Implementation Method 1
a supercritical treatment operation of treating the substrate with the wet upper surface with a supercritical fluid in the supercritical treater
Data Source
AI summary
A method of processing a substrate includes: a liquid treatment operation of performing a liquid treatment on the substrate in a liquid treater to wet an upper surface of the substrate; a transfer operation of transferring the substrate with the wet upper surface from the liquid treater to a supercritical treater; and a supercritical treatment operation of treating the substrate with the wet upper surface with a supercritical fluid in the supercritical treater. When the substrate is determined to be in an untransferable state with respect to the supercritical treater, the liquid treatment operation continues to supply a processing liquid to the substrate.