Liquid Suck-Back System with Water Return Bay for Etching Nozzles
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Solution Overview
Problem
Residual liquid in the liquid supply and suck-back pipelines of single-chip washing and etching machines often flows back to the nozzle, leading to dripping, reduced yield, and increased production costs due to inefficiencies in the existing liquid suck-back systems.
Innovation Solution
A liquid suck-back system comprising a suck-back pipeline with a valve and water return bay, along with a suck-back pump, which operates to suck back residual liquids when the supply pipeline stops, and includes sensors and timers to manage the suck-back process effectively, preventing residual liquids from flowing back to the nozzle.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If residual liquid is not sucked back after etching, then the system structure remains simple, but liquid drips back to the nozzle causing reduced yield and efficiency
Solution Approach 1:
The suck-back pipeline is segmented into multiple sections with separate valves (suck-back valve, water return bay valve) controlling different flow paths. This segmentation allows precise control over liquid flow during suck-back operations, enabling effective residual liquid removal while maintaining system reliability and preventing dripping.
2Reliability
If suck-back operation is performed continuously, then residual liquid is thoroughly removed, but liquid chemicals are wasted and production costs increase
Solution Approach 1:
The system employs sensors (light sensors, flow sensors) to detect the presence and amount of residual liquid in real-time, providing feedback to the control unit. The control unit adjusts the suck-back pump operation and valve control based on this feedback, stopping suck-back when residual liquid is sufficiently removed. This prevents over-suck-back and unnecessary liquid chemical waste while ensuring reliable dripping prevention.
3Loss of time
If suck-back pump operates at high power, then residual liquid is removed quickly, but energy consumption increases
Solution Approach 1:
The suck-back pump operates in periodic cycles rather than continuously, with the control unit activating it based on sensor feedback about residual liquid levels. The pump runs at high power only when needed to remove significant residual liquid, then stops or reduces power when the liquid level decreases. This periodic operation significantly reduces overall energy consumption while maintaining effective suck-back performance and reducing suck-back time compared to continuous low-power operation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively reduces dripping, enhances the yield and efficiency of single-chip washing and etching machines by ensuring residual liquids are retained in the water return bay, thereby minimizing production costs and improving operational efficiency.
Implementation Method 1
the suck-back pump is configured to suck back residual liquid chemicals in the liquid supply pipeline
Data Source
AI summary
The present disclosure provides a liquid suck-back system and a liquid suck-back method, and belongs to the technical field of suck-back of liquid. The liquid suck-back system includes a suck-back pipeline and a suck-back pump. The suck-back pipeline includes a first port and a second port, the first port is connected to the suck-back pump, and the second port is connected to a liquid supply pipeline. The suck-back pipeline includes a suck-back valve and a water return bay, the liquid supply pipeline is configured to supply liquid chemicals, and the suck-back pump is configured to suck back residual liquid chemicals in the liquid supply pipeline when the liquid supply pipeline stops supplying liquid chemicals.