Sulfonic Acid Derivative Thermal Generator for High-Temp Resist
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Solution Overview
Problem
Current thermal acid generators do not effectively achieve high acid generation temperatures, limiting their application in various fields such as semiconductors and display elements.
Innovation Solution
A sulfonic acid derivative compound with a specific structure, represented by Formula (I), is used as a thermal acid generator, which can release a Lewis acid upon heating, inducing decomposition or polymerization in acid-reactive organic substances.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If conventional thermal acid generators (sulfonium salts, onium salts) are used, then acid generation can occur, but the acid generation temperature is limited to 100°C or higher, preventing effective high-temperature acid generation
Solution Approach 1:
The patent changes the chemical structure parameters of the acid generator by using sulfonic acid derivative compounds with specific molecular structures (Formula I) instead of conventional sulfonium or onium salts. This structural parameter change enables the material to achieve high-temperature acid generation (above 200°C) while maintaining effective acid generation capability, thus resolving the contradiction between temperature and reliability.
Solution Approach 2:
The patent employs a composite approach by designing a sulfonic acid derivative compound that integrates specific functional groups (sulfonic acid group combined with specific R1, R2, R3, R4, R5, R6, R7 substituents) to create a material that simultaneously achieves high thermal stability and effective acid generation at elevated temperatures, overcoming the limitations of single-component conventional thermal acid generators.
2Adaptability or versatility
If the acid generation temperature is increased to expand application range, then higher temperature processing becomes possible, but conventional thermal acid generators cannot effectively generate acid at such high temperatures
Solution Approach 1:
By modifying the molecular structure parameters of the acid generator to use sulfonic acid derivatives with specific substituent groups (R1-R7), the patent enables the material to maintain acid generation capability at high temperatures (200°C and above), thereby expanding the temperature range and applicability of thermal acid generators without sacrificing their fundamental acid generation reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The sulfonic acid derivative compound achieves a high acid generation temperature, enabling effective use in resist compositions for applications like semiconductors and display elements by ensuring efficient acid generation and polymerization.
Implementation Method 1
a sulfonic acid derivative compound with a specific structure, represented by Formula (I), is used as a thermal acid generator, which can release a Lewis acid upon heating
Data Source
AI summary
A thermal acid generator having a high acid generation temperature, and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R11 and R12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R2 to R7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R1 is optionally substituted with —O— or the like).