Sulfoxide Glycol Ether Solvent Blend for Photoresist Stripping
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Solution Overview
Problem
Current polar solvents used in the electronics industry, such as N-methyl-2-pyrrolidone, pose reproductive toxicity concerns and regulatory challenges, necessitating the development of eco-friendly alternatives that maintain or exceed their cleaning and stripping performance.
Innovation Solution
A solvent blend comprising a sulfoxide, a glycol ether, and specific amides or amides derivatives, such as N-formyl morpholine, N,N-dimethyl propionamide, and triethyl phosphate, which are combined in specific weight percentages to form a mixture with improved environmental profile and performance for cleaning and stripping electronic components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If NMP is used for cleaning and stripping electronic components, then cleaning ability and stripping ability are improved, but reproductive toxicity and environmental harm worsen
Solution Approach 1:
The patent applies composite materials by formulating a cleaning composition that combines multiple ingredients: a first cleaning agent (such as surfactants), a second cleaning agent (such as solvents like isopropyl alcohol or acetone), and optionally a third cleaning agent. This composite formulation achieves the desired cleaning and stripping performance while avoiding the use of NMP, thereby eliminating its reproductive toxicity concerns.
2Ease of manufacture
If NMP is used for photoresist stripping, then stripping ability is improved, but environmental regulatory compliance worsens
Solution Approach 1:
The patent applies parameter changes by modifying the chemical composition parameters of the cleaning agent. Instead of using NMP with its known toxicological profile, the invention changes to alternative cleaning agents with different chemical parameters (such as surfactants combined with safer solvents) that provide equivalent or superior stripping ability while ensuring compliance with environmental regulations like REACH and TSCA.
3Object-affected harmful factors
If eco-friendly solvents are developed as alternatives to NMP, then environmental profile is improved, but cleaning performance may worsen
Solution Approach 1:
The patent applies merging by combining multiple cleaning agents with complementary functions into a single composition. The first cleaning agent (surfactant) provides emulsification and soil removal, while the second cleaning agent (solvent) provides dissolution of organic contaminants. This synergistic combination achieves cleaning performance comparable to or better than NMP while using environmentally safer ingredients.
Solution Approach 2:
The invention creates a composite cleaning composition that integrates multiple eco-friendly ingredients. By formulating a mixture of surfactants, solvents, and optionally other additives in specific proportions, the composition achieves the necessary cleaning power for electronic components without relying on toxic substances like NMP, thus maintaining performance while improving environmental profile.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solvent blend effectively removes photoresist and polyamic acid residues from electronic substrates with comparable or superior efficiency to NMP, while reducing toxicological concerns and environmental impact, and can be used at temperatures below -25°C for enhanced performance.
Implementation Method 1
The solvent blend effectively removes photoresist and polyamic acid residues from electronic substrates
Implementation Method 2
The solvent blend effectively removes photoresist and polyamic acid residues from electronic substrates
Data Source
AI summary
Solvents useful for removing, among other things, photoresists and poly (amic acid) /polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of a sulfoxide, e.g., DMSO; (B) a second component consisting of a glycol ether, e.g., ethylene glycol monobutyl ether; and (C) a third component consisting of at least one of N-formyl morpholine, N, N-dimethyl propionamide, 3-methoxy-N, N-dimethyl propanamide, triethyl phosphate, N, N-dimethyl acetamide; N, N-diethyl acetamide, N, N-diethyl propionamide, N-methyl acetamide, N-methyl propionamide, N-ethyl acetamide, and N-ethyl propionamide.