Oxide Superconducting Alignment Film Underlying Layer
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Solution Overview
Problem
Existing methods for forming an underlying layer of an alignment film for oxide superconducting conductors face challenges in achieving a high diffusion prevention effect without increasing film thickness, which can lead to substrate warping due to internal stress, and are inefficient in terms of productivity and applicability to elongated base materials.
Innovation Solution
A method involving the simultaneous irradiation of an ion beam on multiple targets arranged along the length of a base material to deposit constituent particles, forming a laminate structure with a diffusion prevention layer and a bed layer repeatedly laminated, using an ion beam assisted deposition (IBAD) method, allowing for the formation of a thin film with a high diffusion prevention effect in a single process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the thickness of the diffusion prevention layer is increased to achieve high diffusion prevention effect, then the diffusion prevention effect is improved, but the substrate warping occurs due to internal stress
Solution Approach 1:
The diffusion prevention layer is segmented into multiple thin layers (first diffusion prevention layer and second diffusion prevention layer) separated by an intermediate layer. This segmentation allows each layer to be thin enough to avoid excessive internal stress while collectively providing strong diffusion prevention effect. The intermediate layer acts as a stress relief interface between the segmented layers.
2Reliability
If multiple thin films are formed by repeated deposition processes to create laminate structure, then the diffusion prevention effect is improved, but the production time and cost increase
Solution Approach 1:
Multiple deposition processes that would normally be performed separately are merged into a single continuous deposition process. The first diffusion prevention layer, intermediate layer, and second diffusion prevention layer are deposited sequentially in one uninterrupted operation, eliminating the need for separate process setups, chamber evacuations, and timing coordination that would occur with multiple independent deposition steps.
Solution Approach 2:
The deposition apparatus is designed with multi-functionality to deposit different materials (diffusion prevention material and intermediate layer material) without requiring process interruption. The system can switch between depositing different materials while maintaining the same operational mode, making the deposition process universal and eliminating the need for separate specialized deposition steps.
3Manufacturing precision
If conventional separate deposition processes are used to form multiple layers, then each layer can be formed with controlled properties, but the applicability to elongated base materials is reduced
Solution Approach 1:
The deposition process operates continuously as the elongated base material moves through the deposition apparatus. Both the first diffusion prevention layer and the intermediate layer are deposited in a continuous manner without stopping the material transport, ensuring uniform layer properties along the entire length of the base material while maintaining manufacturing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables a high diffusion prevention effect while maintaining a thin film thickness, reducing production costs and improving productivity by allowing the formation of a laminate structure with multiple thin films in one process, effectively preventing base material constituent element diffusion during high-temperature processes.
Implementation Method 1
a technique of depositing on a base material constituent particles that are ejected from a target by a sputtering method
Implementation Method 2
simultaneously irradiating from an oblique direction (for example, 45 degrees) argon ions and oxygen ions, etc. which are generated from an ion gun
Data Source
AI summary
A method of forming an underlying layer of an alignment film for an oxide superconducting conductor, includes arranging two or more kinds of targets along a lengthwise direction of a base material so as to face a surface of the base material; simultaneously irradiating an ion beam on surfaces of the two or more kinds of targets to deposit constituent particles of the targets on the surface of the base material in the order of the arrangement of the two or more kinds of targets; and forming a laminate in which two or more kinds of thin films are repeatedly laminated on the surface of the base material by passing the base material through a deposition region of the constituent particles a plurality of times so that the constituent particles of the targets are repeatedly deposited on the surface of the base material at each passage.