Superconducting Film Kinetic Inductance via Hydrogen Diffusion

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Solution Overview

Problem

The integration level of quantum circuits is limited by the low kinetic inductance of superconducting films, which, when increased through existing methods, results in negative effects such as reduced quality factor and altered chemical ratios, affecting the performance of quantum devices.

Innovation Solution

A method involving heating a superconducting film in a hydrogen atmosphere to fill micro-scale crystal structure defects with free hydrogen atoms, maintaining this state for a duration, and then cooling, to enhance kinetic inductance without affecting the quality factor or chemical composition of the film.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If the thickness of the superconducting film is increased to improve kinetic inductance, then the integration level of the quantum circuit is improved, but the quality factor of the circuit is reduced

Engineering Contradiction:
Improvekinetic inductanceVSAvoidquality factor
Core Design Contradiction:
Quantity of substanceVSReliability

Solution Approach 1:

The patent changes the chemical composition parameter of the superconducting film by introducing hydrogen atoms into crystal defects, transforming the film from a conventional superconducting material to a hydrogen-doped superconducting material. This parameter change enables simultaneous improvement of kinetic inductance and quality factor, resolving the technical contradiction between these two parameters.

Inventive Principle:
Principle #35Parameter changes

2Quantity of substance

If the chemical composition of the superconducting film is changed to increase kinetic inductance, then the integration level is improved, but the chemical ratio of the film is affected

Engineering Contradiction:
Improvekinetic inductanceVSAvoidchemical ratio
Core Design Contradiction:
Quantity of substanceVSStability of the object's composition

Solution Approach 1:

The patent applies local quality by introducing hydrogen atoms specifically into micro-scale crystal structure defects rather than uniformly changing the entire film composition. This localized modification targets the kinetic inductance enhancement while preserving the overall chemical ratio and composition stability of the superconducting film.

Inventive Principle:
Principle #3Local quality

3Quantity of substance

If the deposition conditions are adjusted to improve kinetic inductance, then the integration level is improved, but other basic physical parameters of the film are affected

Engineering Contradiction:
Improvekinetic inductanceVSAvoidbasic physical parameters
Core Design Contradiction:
Quantity of substanceVSManufacturing precision

Solution Approach 1:

The patent employs preliminary action by first depositing a conventional superconducting film with standard deposition conditions, then subsequently introducing hydrogen atoms into the film's crystal defects. This two-stage approach allows the film to be formed with precise control of basic physical parameters first, and then modifies the kinetic inductance property without re-affecting the already-established film quality parameters.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach significantly increases the kinetic inductance of superconducting films, improving circuit density and integration level without compromising the quality factor, enabling more efficient quantum device integration.

Implementation Method 1

micro-scale crystal structure defects of the first superconducting film are filled with the hydrogen atoms

Methodology Applied
Scientific EffectDiffusion: Diffusion

Data Source

PatentUS20240147870A1Method for manufacturing superconducting films, superconducting film, quantum device, and quantum chip
Publication Date: 2024.05.02 ALIBABA DAMO (HANGZHOU) TECH CO LTD
  • US20240147870A1 patent drawing
  • US20240147870A1 patent drawing

AI summary

A method for manufacturing superconducting films. The method includes: heating a first atmosphere environment where a first superconducting film is located from a first temperature to a second temperature, so that the first superconducting film is in a second atmosphere environment, the first superconducting film being a superconducting material deposited on a substrate; continuously introducing hydrogen atoms into the second atmosphere environment and maintaining for a predetermined duration after the second atmosphere environment reaches the second temperature, so that the first superconducting film is in a third atmosphere environment and micro-scale crystal structure defects of the first superconducting film are filled with the hydrogen atoms, the second temperature being configured to maintain a free state of the hydrogen atoms; and cooling the third atmosphere environment from the second temperature to a third temperature less than the first temperature after the predetermined duration to manufacture a second superconducting film.