Supercritical Drying Chamber Airflow for Temperature Uniformity
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Solution Overview
Problem
Conventional supercritical drying apparatuses experience temperature imbalances due to stagnant airflow, fume discharge, and convective heat transfer, which affect the uniformity and efficiency of the drying process for semiconductor substrates.
Innovation Solution
A substrate treating apparatus and method that utilize a controlled downward airflow system within the process chamber, adjusting airflow speeds and amounts based on substrate handling steps, and employing a supercritical fluid for drying, to minimize temperature imbalances and efficiently remove fumes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If a conventional supercritical drying apparatus is used, then the substrate can be dried using a supercritical fluid, but temperature imbalance occurs due to stagnant airflow and convective heat transfer
Solution Approach 1:
The patent introduces an airflow generating member that supplies air into the process chamber to create forced convection, replacing the stagnant natural convection system. This pneumatic intervention eliminates temperature imbalance by ensuring uniform heat distribution throughout the chamber during supercritical drying operations.
Solution Approach 2:
The system dynamically adjusts airflow parameters (flow rate, distribution pattern) based on process conditions to optimize temperature uniformity. By changing the airflow state from stagnant to actively circulating, the system resolves the temperature imbalance without requiring fundamental redesign of the drying apparatus.
2Ease of operation
If the process chamber is opened for substrate handling, then substrates can be loaded and unloaded, but fume accumulates inside the chamber
Solution Approach 1:
The airflow generating member creates a continuous air flow that actively exhausts fumes from the process chamber during substrate loading and unloading operations. This pneumatic exhaust system allows frequent chamber opening for substrate handling while simultaneously removing harmful fumes, resolving the contradiction between operational ease and fume accumulation.
3Productivity
If air flow is increased to remove fumes quickly, then fume removal is accelerated, but temperature uniformity deteriorates due to enhanced convective heat transfer
Solution Approach 1:
The system dynamically adjusts airflow characteristics based on process stage: during substrate handling, high airflow prioritizes fume removal; during supercritical drying, optimized airflow maintains temperature uniformity. This dynamic adaptation resolves the contradiction between fume removal speed and temperature uniformity by adjusting flow parameters in real-time.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The controlled airflow system enhances temperature uniformity and accelerates the removal of fumes, preventing early drying and ensuring effective substrate treatment in a high-pressure chamber.
Implementation Method 1
a spray unit configured to be provided at above the treating module and which sprays an air supplied from the pan unit
Implementation Method 2
an exhaust unit configured to exhaust an air sprayed by the spray unit to outside of the treating module
Implementation Method 3
a supercritical drying process for removing the treating liquid remaining on the substrate using a supercritical fluid
Data Source
AI summary
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes treating modules having an opening for taking in and taking out a substrate and which are stacked on each other; and an air flow generating member for generating a downward airflow at each treating module, and wherein the air flow generating member includes: a pan unit configured to supply an air; a spray unit configured to be provided above the treating module and which sprays an air supplied from the pan unit; and an exhaust unit configured to exhaust an air sprayed by the spray unit to outside of the treating module.