Supercritical Fluid Endpoint Detection via Phase Transition
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Solution Overview
Problem
In the field of integrated semiconductor device manufacture, existing methods lack effective means to determine the end point of supercritical fluid processes, which is crucial for ensuring the reliability and completeness of processes such as drying, cleaning, and etching, due to the difficulty in monitoring the concentration of target materials in real-time during these processes.
Innovation Solution
A substrate processing method and system that utilizes a supercritical fluid process chamber equipped with a detection unit capable of analyzing the concentration of target materials in the discharged fluid, either by heating to maintain a gas phase, condensing to a liquid phase, or mixing with a reference liquid, to determine the end point of the process, thereby allowing for real-time monitoring and control of the process completion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If real-time concentration detection of target material in discharged supercritical fluid is implemented, then process endpoint determination reliability is improved, but device complexity increases due to additional detection units and phase transformation components
Solution Approach 1:
The patent utilizes phase transitions of the supercritical fluid (between gas and liquid phases) to enable concentration detection. The detection unit transforms the supercritical fluid into a detectable phase by controlling temperature and pressure changes, allowing target material concentration to be measured through optical or other detection methods without requiring complex in-situ supercritical phase detectors
Solution Approach 2:
The patent introduces an intermediary detection mechanism where the supercritical fluid is transformed into a different phase (gas or liquid) that can be more easily analyzed for target material concentration. This intermediary phase transformation serves as a bridge between the supercritical processing environment and the detection system, simplifying the overall detection architecture
2Manufacturing precision
If supercritical fluid process is used for semiconductor manufacturing, then manufacturing precision is improved, but difficulty in detecting and measuring target material concentration increases
Solution Approach 1:
The detection unit exploits phase transitions to convert the supercritical fluid into a measurable phase. By controlling temperature and pressure to transform the supercritical fluid into gas or liquid phase, the target material concentration becomes detectable using standard analytical techniques, thereby reducing the difficulty of measurement while preserving the precision benefits of supercritical fluid processing
3Measurement precision
If detection unit transforms supercritical fluid to gas or liquid phase for detection, then measurement precision is improved, but use of energy increases due to heating and cooling requirements
Solution Approach 1:
The system utilizes phase transitions to achieve measurable states for concentration detection. The detection unit applies controlled heating or cooling to transform the supercritical fluid into gas or liquid phase, enabling precise measurement of target material concentration. The energy consumption is managed by optimizing the phase transformation conditions and recovering energy where possible
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables reliable and efficient completion of supercritical fluid processes by allowing real-time detection and analysis of target material concentrations, improving the precision and reliability of semiconductor manufacturing operations.
Implementation Method 1
heating the supercritical fluid discharged from the process chamber to maintain the supercritical fluid in a gas phase
Implementation Method 2
condensing the supercritical fluid discharged from the process chamber to liquid phase
Implementation Method 3
mixing the target material in the liquid phase with a reference liquid
Data Source
AI summary
In a supercritical fluid method a supercritical fluid is supplied into a process chamber. The supercritical fluid is discharged from the process chamber as a supercritical fluid process proceeds. A concentration of a target material included in the supercritical fluid discharged from the process chamber is detected during the supercritical fluid process. An end point of the supercritical fluid process may be determined based on a detected concentration of the target material.