Supercritical Fluid Line Particle Detection for Substrate Treatment
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Solution Overview
Problem
In semiconductor processing, metal particles released from components in the fluid supply line during supercritical fluid treatment can contaminate substrates, making it difficult to identify which component is defective among multiple components.
Innovation Solution
A substrate treating apparatus with a detection member that includes upstream and downstream detection ports connected to the fluid supply line, allowing for the detection of metal particles before and after passing through specific components, enabling the identification of defective components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If multiple metal components are installed in the fluid supply line to withstand high pressure, then the reliability of the supercritical fluid supply is improved, but the risk of metal particle release increases and the difficulty of identifying the defective component worsens
Solution Approach 1:
The fluid supply line is divided into multiple segments with detection ports positioned between components. This segmentation allows the detection device to isolate and identify which specific component segment is releasing metal particles, solving the identification difficulty while maintaining the use of multiple metal components for reliability
Solution Approach 2:
A detection device is introduced as an intermediary between the metal components and the substrate. This intermediary detects metal particles in the fluid stream and provides information about which component is defective, allowing the system to maintain reliable metal components while identifying and replacing only the problematic ones
2Stress or pressure
If metal components are used in the fluid supply line, then the ability to withstand high pressure is improved, but metal particle contamination of substrates occurs
Solution Approach 1:
The detection device acts as an intermediary monitoring system that detects metal particles released from components before they can contaminate substrates. This allows the system to maintain the necessary high-pressure metal components while preventing contamination by identifying and addressing particle release issues
Solution Approach 2:
The detection device provides feedback about metal particle presence and component condition. This feedback mechanism allows the system to maintain high-pressure operation with metal components while continuously monitoring for contamination risks and enabling timely intervention when particles are detected
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Facilitates the easy identification and replacement of components releasing metal particles, preventing contamination of substrates and ensuring the quality of treated substrates.
Implementation Method 1
a detector provided to be coupled to a selected detection port between the upstream detection port and the downstream detection port, and detecting metal particles from a fluid flowing through the detection port from the fluid supply line
Implementation Method 2
Carbon dioxide, which is maintained in a supercritical state at a relatively low temperature and well dissolves isopropyl alcohol remaining on the substrate, is mainly used as the supercritical fluid
Data Source
AI summary
Provided is a substrate treating apparatus including: a fluid supply unit supplying a supercritical fluid to the treatment space, a plurality of components installed in the fluid supply line; and a detection member detecting whether or not metal particles are released from the component. The detection member includes: an upstream detection port connected to the fluid supply line upstream from a first component which is one of the plurality of components; a downstream detection port connected to the fluid supply line downstream from the first component; and a detector provided to be coupled to a selected detection port between the upstream detection port and the downstream detection port, and detecting metal particles from a fluid flowing through the detection port from the fluid supply line.