Supercritical Substrate Drying With Fixed Horizontal Transfer

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Solution Overview

Problem

Existing substrate drying technologies using supercritical fluids face challenges in efficiently and uniformly processing substrates due to the need for rotating transfer arms, which can cause liquid film scattering and pattern collapse, and require larger apparatus footprints.

Innovation Solution

A substrate processing apparatus with a fixed supporting body within the drying chamber, allowing direct horizontal transfer of substrates without rotation, and utilizing a scaled-down drying unit with separate fluid paths for efficient supercritical fluid replacement, reducing apparatus size and minimizing liquid film scattering.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If a rotating transfer arm is used to transfer substrates in the drying chamber, then the substrate can be transferred, but liquid film scattering and pattern collapse occur

Engineering Contradiction:

Improvesubstrate transfer capabilityVSAvoidliquid film uniformity and pattern integrity

Core Design Contradiction:

Ease of operationVSManufacturing precision

Solution Approach 1:

Instead of rotating the transfer arm to position substrates, the patent inverts the approach by using a fixed transfer arm and rotating the substrate holder or using linear positioning mechanisms. This eliminates the scattering caused by arm rotation while maintaining substrate transfer capability.

Inventive Principle:

Principle #13The other way round (Inversion)

Solution Approach 2:

The transfer mechanism is segmented into a fixed arm structure and a movable substrate positioning component. This allows the transfer function to be separated from the rotation function, enabling precise substrate placement without liquid film disturbance.

Inventive Principle:

Principle #1Segmentation

2Productivity

If a conventional drying apparatus with movable cover body and substrate placing table is used, then the apparatus can perform drying operations, but the apparatus footprint becomes larger

Engineering Contradiction:

Improvedrying operation capabilityVSAvoidapparatus footprint

Core Design Contradiction:

ProductivityVSArea of stationary object

Solution Approach 1:

The patent merges the cover body and substrate holder into a single integrated unit that performs both protective covering and substrate positioning functions. This eliminates the need for separate movable components, reducing the apparatus footprint while maintaining drying operation capability.

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The integrated cover body serves multiple functions: it acts as a protective cover, a substrate holder, and a positioning mechanism. This multi-functionality reduces the number of components needed, thereby reducing the overall apparatus size.

Inventive Principle:

Principle #6Universality (Multi-functionality)

3Ease of operation

If the supporting body is made movable to facilitate substrate transfer, then substrate access is improved, but liquid film scattering increases

Engineering Contradiction:

Improvesubstrate accessVSAvoidliquid film uniformity

Core Design Contradiction:

Ease of operationVSManufacturing precision

Solution Approach 1:

Instead of making the supporting body movable, the patent inverts the approach by keeping the supporting body fixed and using a movable transfer mechanism that approaches the fixed support. This eliminates vibrations from movable supports while maintaining substrate access.

Inventive Principle:

Principle #13The other way round (Inversion)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enhances substrate processing efficiency by preventing liquid film scattering and pattern collapse while reducing apparatus size, thus improving processing uniformity and throughput.

Implementation Method 1

a drying unit configured to replace the liquid film with a supercritical fluid to dry the substrate

Methodology Applied

Scientific EffectSupercritical fluid: Supercritical Fluid

Implementation Method 2

drying unit configured to replace the liquid film with a supercritical fluid to dry the substrate

Methodology Applied

Scientific EffectSupercritical drying: Supercritical Drying

Data Source

PatentUS20250273485A1Substrate processing apparatus and substrate processing method

Publication Date: 2025.08.28 TOKYO ELECTRON LTD

AI summary

A substrate processing apparatus includes a transfer block in which a transfer device configured to transfer a substrate is placed, and a processing block provided adjacent to the transfer block. The processing block includes a liquid film forming unit configured to form a liquid film on a top surface of the substrate which is held horizontally, and a drying unit configured to replace the liquid film with a supercritical fluid to dry the substrate. The drying unit includes a pressure vessel having therein a drying chamber for the substrate, a cover body configured to close an opening of the drying chamber, and a supporting body configured to support the substrate horizontally in the drying chamber. The supporting body is fixed to the drying chamber. The transfer device advances into the drying chamber through the opening of the drying chamber while holding horizontally the substrate having the liquid film thereon.