Super-Junction MOS with Integrated TMBS for Reverse Recovery

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Solution Overview

Problem

Common super-junction MOS devices suffer from poor reverse recovery characteristics, leading to higher peak reverse-recovery currents and potential device damage in hard switching applications, making them hazardous.

Innovation Solution

Integration of a Trench-MOS-Barrier-Schottky (TMBS) structure within the super-junction MOS device, connected in parallel with adjacent cells, which improves reverse recovery characteristics without adding extra process steps, thereby enhancing safety and simplifying manufacturing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a common super-junction MOS device structure is used, then the device achieves good balance between voltage resistance and on-resistance, but the parasitic diode exhibits poor reverse recovery characteristics leading to higher peak reverse-recovery currents and potential device damage

Engineering Contradiction:
Improvereverse recovery characteristicsVSAvoidpeak reverse-recovery current
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The device is divided into multiple parallel cells, with a TMBS structure integrated between adjacent cells. This segmentation allows the TMBS structure to specifically address reverse recovery issues in certain regions while maintaining the super-junction MOS device's voltage resistance and on-resistance balance in other regions.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The TMBS structure acts as an intermediary element integrated between adjacent cells of the super-junction MOS device. It provides a dedicated path for reverse recovery current management, mediating the harmful effects of peak reverse-recovery currents while preserving the overall device performance.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If an integrated TMBS structure is added to improve reverse recovery characteristics, then reverse recovery performance is enhanced, but device complexity increases

Engineering Contradiction:
Improvereverse recovery characteristicsVSAvoidstructure integration
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The TMBS structure is merged with the super-junction MOS device by integrating it between adjacent cells sharing common substrate and epitaxial layer. This combining approach enhances reverse recovery characteristics while avoiding the need for separate discrete components, thus limiting the increase in device complexity.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The integrated TMBS structure serves multiple functions: it improves reverse recovery characteristics, provides a path for reverse recovery current management, and maintains compatibility with the existing super-junction MOS device architecture. This multi-functionality justifies the added structural complexity by delivering multiple benefits from a single integration.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS20240079445A1Super-junction MOS device with integrated TMBS structure and manufacturing method thereof
Publication Date: 2024.03.07 HANGZHOU SILICON-MAGIC SEMICON TECH CO LTD
  • US20240079445A1 patent drawing
  • US20240079445A1 patent drawing
  • US20240079445A1 patent drawing

AI summary

A super-junction MOS device with an integrated TMBS structure and a manufacturing method thereof are provided. The super-junction MOS device includes a main body. The TMBS structure is connected in parallel between at least two cells of the main body.