Supersaturated Sublimation Liquid for Pattern Collapse Prevention
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Solution Overview
Problem
Conventional substrate processing liquids using sublimable substances like camphor or cyclohexanone oxime in IPA solutions have low concentration levels, leading to inadequate film formation between patterns, resulting in pattern collapse during the drying process due to insufficient sublimable substance distribution and residual solvent issues.
Innovation Solution
A substrate processing liquid with a sublimable substance, solvent, and an auxiliary agent that disperses particles exceeding solubility limits, creating a supersaturated solution to enhance sublimable substance concentration and recrystallization between patterns, ensuring effective sublimation drying and pattern retention.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If the concentration of sublimable substance in the processing liquid is increased, then the sublimation drying performance is improved, but the solubility limit of the sublimable substance in the solvent is exceeded causing precipitation
Solution Approach 1:
The patent changes the chemical composition parameters of the processing liquid by introducing a specific auxiliary agent (crystallization inhibitor) that modifies the solubility characteristics of the system. This allows the sublimable substance concentration to exceed the original solubility limit without precipitation, achieving both high concentration and compositional stability simultaneously
Solution Approach 2:
The auxiliary agent acts as an intermediary substance that mediates between the sublimable substance and solvent. It prevents direct precipitation of the sublimable substance by interfering with crystal nucleation and growth, thereby maintaining solution stability at supersaturated concentrations
2Reliability
If the sublimable substance is used to form a solidified film for pattern support, then pattern collapse is prevented, but residual solvent remains in the solidified film causing incomplete drying
Solution Approach 1:
The patent ensures continuous sublimation action by maintaining the solidified film structure that supports patterns throughout the drying process. The auxiliary agent enables sustained sublimation by preventing premature crystallization that would trap solvent, allowing complete solvent removal while maintaining pattern support
Solution Approach 2:
The patent utilizes the phase transition of the sublimable substance from solid to gas to achieve drying. The controlled sublimation process, enabled by the auxiliary agent, allows the solidified film to gradually sublime without collapsing, continuously removing solvent while maintaining structural support until complete drying is achieved
3Productivity
If the processing liquid is supplied onto the substrate to replace DIW with IPA, then liquid removal is initiated, but the low concentration of sublimable substance prevents sufficient film formation between patterns
Solution Approach 1:
The patent fundamentally changes the concentration parameter of the processing liquid by adding a crystallization inhibitor that enables supersaturation. This allows the liquid replacement process to occur with high sublimable substance concentration, ensuring sufficient film formation between patterns while maintaining high liquid replacement efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The enhanced concentration and metastable state of the sublimable substance in the processing liquid allow for improved sublimation drying, effectively removing adhered liquids from substrates while preventing pattern collapse by ensuring a solid phase holds the patterns firmly during the drying process.
Implementation Method 1
an auxiliary agent that is added to a solution in which the sublimation substance is dissolved in the solvent to disperse particles of the sublimation substance exceeding the solubility in the solution
Implementation Method 2
The substrate processing liquid comprises: a sublimable substance; a solvent that dissolves the sublimable substance; and an auxiliary agent that is added to a solution in which the sublimation substance is dissolved in the solvent to disperse particles of the sublimation substance exceeding the solubility in the solution
Implementation Method 3
solidifying the liquid film of the substrate processing liquid, to thereby form a solidified film of the sublimable substance
Implementation Method 4
sublimating the solidified film, to thereby remove the solidified film from the front surface of the substrate
Data Source
AI summary
In the present invention, a substrate processing liquid includes an auxiliary agent which is added to a solution in which a sublimable substance is dissolved in a solvent, to thereby disperse particles of the sublimable substance, the amount of which exceeds the solubility, in the solution. In the substrate processing liquid, the particles of the sublimable substance, the amount of which exceeds the solubility, are uniformly dispersed and dissolved in the solvent. Therefore, the amount of sublimable substance to be supplied onto a pattern formation surface of a substrate is larger than that in the conventional technique and a large amount of sublimable substance (solid phase) exists inside a pattern. As a result, it is possible to effectively suppress the solvent from remaining between the patterns and perform sublimation drying in a state where the patterns are firmly held by the sublimable substance (solid phase).