Supersonic Nozzle PVD for Ceramic-Metal Composite Films
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Solution Overview
Problem
Current physical vapor deposition methods face challenges in forming high-density films with materials that are hard to evaporate, such as ceramics, which often result in brittle films with poor adhesion to substrates, and require multiple vacuum vessels and heating devices.
Innovation Solution
A physical vapor deposition apparatus and method that combines metal fine particles with ceramic powder, using a supersonic nozzle to mix and deposit the materials onto a substrate, eliminating the need for multiple vacuum vessels and heating devices.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If ceramic materials are used for film formation by conventional vapor deposition, then heat resistance and chemical stability are improved, but the films become brittle and have poor adhesion to substrates
Solution Approach 1:
The patent applies composite materials by combining ceramic powder particles with metal fine particles (such as iron, nickel, or cobalt) to form a composite coating film. The metal particles act as a binder matrix that provides adhesion and flexibility, while the ceramic particles provide heat resistance and chemical stability. This composite structure resolves the contradiction by integrating the advantages of both material types.
Solution Approach 2:
The patent changes the physical state and composition parameters of the coating material by using a mixture of fine particles rather than pure ceramic vapor. The particle size distribution, composition ratio, and physical state (fine particles vs. vapor) are controlled parameters that enable the formation of a flexible, adherent film while maintaining ceramic properties.
2Manufacturing precision
If multiple vacuum vessels and heating devices are used for film formation, then film quality is improved, but device complexity increases
Solution Approach 1:
The patent merges multiple functions into a single integrated system. Instead of using separate vacuum vessels for different materials and separate heating devices for different processes, the invention combines the vapor deposition process with a powder supply system and uses a single vacuum chamber for all operations. This integration reduces device complexity while maintaining film quality.
Solution Approach 2:
The patent creates a universal deposition system that can handle multiple materials and functions within a single apparatus. The system universally accommodates different powder materials, controls vacuum conditions, and performs deposition in one integrated environment, eliminating the need for multiple specialized vessels and heating devices.
3Manufacturing precision
If fine particles are produced by evaporating source material, then film density is improved, but the process requires complex heating and vacuum systems
Solution Approach 1:
The patent replaces complex thermal evaporation systems with a mechanical powder supply and deposition system. Instead of heating source material to evaporate it and then cooling it to condense particles, the invention directly supplies pre-formed fine particles through a powder supply source, using mechanical means to deliver particles to the substrate without requiring complex heating and vacuum cycling.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the formation of stable, high-density films with improved adhesion and reduced brittleness, while simplifying the process by eliminating the need for multiple vacuum vessels and heating devices.
Implementation Method 1
heating part for heating the evaporation source material, which heats the evaporation source material by the heating part under a predetermined gas atmosphere or air atmosphere to evaporate it, and which produces fine particles from evaporated atoms
Implementation Method 2
a supersonic nozzle which is connected to the mixing part, and a substrate for film formation, which makes the fine particles and the powder transported from the evaporation chamber and the powder supply source ride on a supersonic gas stream created by the supersonic nozzle
Implementation Method 3
deposits the fine particles and the powder on the substrate for film formation by physical vapor deposition
Implementation Method 4
a mixing part which is connected to transport pipes which form paths for transporting a gas which contains the fine particles from the evaporation chamber and for transporting a gas containing the powder from the powder supply source and which mixes the fine particles and the powder
Data Source
AI summary
A physical vapor deposition apparatus and a physical vapor deposition method for forming a film of a substance which is hard to be made fine particles even when it is heated by plasma, arc discharge, or the like are provided. It has an evaporation chamber 10 provided inside it with an evaporation source material 15 and a heating part 16 for heating the evaporation source material 15, a powder supply source 20 provided inside it with a powder, and a film forming chamber 30, wherein the evaporation source material 15 is heated by the heating part 16 to produce fine particles (nanoparticles), the fine particles and powder are sprayed out of a supersonic nozzle 35, are placed on a supersonic gas stream, and are deposited on a substrate for film formation 33 by physical vapor deposition.