Support Unit Measurement Grooves for Substrate State Detection
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing substrate treatment apparatuses face challenges in determining the proper support and state of substrates during etching processes, as sensors are often centrally located and cannot detect substrate breakage or whole-state conditions effectively.
Innovation Solution
A support unit with measurement grooves and guide grooves on the support plate, equipped with sensors to measure pressure, allowing for accurate detection of substrate positioning, breakage, and bending, and a control unit to transmit pressure values for determining the supported state.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a sensor is disposed on a central portion of the support unit, then the device complexity is reduced, but the measurement precision deteriorates because it cannot detect substrate breakage or whole-state conditions
Solution Approach 1:
The support plate is segmented with multiple measurement grooves distributed across its surface (central groove, radial grooves, circumferential grooves). Sensors are placed at multiple locations corresponding to these grooves, dividing the detection task across multiple measurement points rather than relying on a single central sensor. This segmentation enables comprehensive substrate state monitoring while maintaining manageable device complexity.
Solution Approach 2:
The measurement system transitions from a single-point (central) measurement to a multi-dimensional measurement network. The grooves are arranged in different spatial dimensions (radial direction, circumferential direction, central region) creating a two-dimensional measurement matrix that covers the entire substrate area, enabling detection of breakage and bending states that a single central sensor cannot detect.
2Measurement precision
If measurement grooves are extended to the edge area of the support plate, then the measurement precision is improved for detecting substrate breakage, but the device complexity increases due to additional groove structures
Solution Approach 1:
The measurement grooves serve multiple functions simultaneously: they act as measurement channels for pressure sensors, provide structural support patterns on the support plate, and create reference geometries for substrate positioning. The radial grooves extend from center to edge to detect breakage, while circumferential grooves monitor bending, making the groove system universally functional rather than adding separate components for each measurement type.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise positioning and state detection of substrates, ensuring reliable etching processes and preventing substrate damage during plasma treatment.
Implementation Method 1
a sensor for measuring a pressure in the measurement groove in the state where the substrate is placed on the support plate
Implementation Method 2
The plasma may be generated by a very high temperature, strong electric fields, or high-frequency electromagnetic fields (EF)
Implementation Method 3
electromagnetic fields may be formed in an inner space of a chamber to form plasma. The electromagnetic fields may excite a process gas provided into the chamber into a plasma state
Data Source
AI summary
Provided is a support unit. The support unit includes a support plate having a top surface in which a measurement groove is defined and on which a substrate is placed, and a sensor for measuring a pressure in the measurement groove in the state where the substrate is placed on the support plate. The measurement groove has a main measurement groove that extends from a central area of the support plate up to an edge area of the support plate.