Supporting Chamber Pressure Equalization for Substrate Processing
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Solution Overview
Problem
The introduction of a fluid in a supercritical state into process chambers can deform, damage, or reduce the structural stability and durability of components, leading to deteriorated process performance in integrated circuit and display device manufacturing.
Innovation Solution
A supporting device with a supporting chamber and supply member is used to equalize pressure within the process chamber, utilizing branch lines and control valves to manage fluid flow and maintain stability, preventing deformation and damage from high pressures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a fluid in a supercritical state is introduced into the process chamber, then the processing capability is improved, but the structural stability and durability of the process chamber components are reduced due to high pressure
Solution Approach 1:
A supporting chamber is introduced as an intermediary component between the external environment and the process chamber. This supporting chamber receives the supercritical fluid and distributes it through branch lines to multiple locations within the process chamber, thereby mediating the pressure transmission and preventing direct concentration of high pressure on single components, thus protecting structural stability while maintaining processing capability
2Productivity
If high pressure fluid is supplied directly into the process chamber, then the processing efficiency is enhanced, but the components of the process chamber are deformed or damaged
Solution Approach 1:
The fluid supply system is segmented into multiple branch lines that distribute the supercritical fluid to different locations within the process chamber. This segmentation prevents concentration of high pressure on single components, reducing deformation and damage risk while maintaining overall processing efficiency through distributed fluid delivery
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances the structural stability and durability of process chambers, improving the reliability of processes and reducing manufacturing costs for integrated circuit and display devices.
Implementation Method 1
a pressure in the supporting chamber is substantially equal to or greater than a pressure in the process chamber
Data Source
AI summary
An apparatus for processing a substrate may include a process chamber providing a processing space in which a predetermined process may be performed on the substrate, and a supporting device contacting the process chamber and supporting the process chamber. The supporting device may include a supporting chamber providing a supporting space for supporting components of the process chamber and a supply member supplying a fluid into the supporting space.