Surface Film Layer Analysis for OLED Deposition Quality Control

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Solution Overview

Problem

Manufacturing of electronic displays, particularly OLED displays, requires precise quality control to ensure factors such as bank opening size, bank wall slope, bank depth, bank pitch, and taper distance, as well as fluid properties and deposition techniques, to produce viable products with consistent luminance and performance.

Innovation Solution

A method involving the analysis of three-dimensional data from electronic display substrates to extract parameters like film layer thickness, area aperture ratios, and pitch, displayed through graphical user interfaces, allowing for dynamic modification and comparison to quality control standards.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If traditional quality control methods are used for OLED display manufacturing, then the manufacturing process is simpler, but the manufacturing precision and consistency of film layer quality deteriorate

Engineering Contradiction:
Improvefilm layer thickness precisionVSAvoidquality control system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent replaces traditional mechanical contact-based thickness measurement methods with optical measurement systems that use light to non-contactly measure film layer thickness, thereby improving measurement precision without requiring physical contact that could contaminate or damage the delicate OLED layers

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent introduces an intermediary optical measurement system between the film layer deposition process and quality assessment, using optical properties (reflectance, transmittance) as a mediator to indirectly but precisely determine film layer characteristics without direct physical intervention

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If real-time feedback systems are implemented for deposition process control, then the manufacturing precision improves, but the device complexity and cost increase

Engineering Contradiction:
Improvedeposition process control precisionVSAvoidreal-time feedback system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent implements a feedback system where optical measurements taken during or after deposition are fed back to control the deposition process parameters, allowing real-time adjustments to maintain optimal film layer quality without requiring complex multi-parameter monitoring systems

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent focuses on monitoring and controlling a limited set of critical optical parameters (such as reflectance ratio or transmittance) that directly correlate with film layer quality, rather than attempting to control all possible deposition parameters, thereby simplifying the feedback system while maintaining precision

Inventive Principle:
Principle #35Parameter changes

3Measurement precision

If comprehensive parameter extraction and analysis are performed on all pixels, then the quality control accuracy improves, but the analysis time and processing complexity increase

Engineering Contradiction:
Improvequality control accuracyVSAvoidanalysis time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent applies local quality control by analyzing specific regions or representative samples of pixels rather than uniformly processing every single pixel, allowing high measurement precision on critical areas while reducing overall analysis time through selective sampling

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent performs comprehensive analysis on a subset of pixels that are sufficient to determine overall quality (partial action), rather than analyzing every pixel, thereby achieving adequate quality control accuracy with reduced processing time and computational resources

Inventive Principle:
Principle #16Partial or excessive action

Data Source

PatentUS12488449B2Analysis of material layers on surfaces, and related systems and methods
Publication Date: 2025.12.02 KATEEVA INC
  • US12488449B2 patent drawing
  • US12488449B2 patent drawing
  • US12488449B2 patent drawing

AI summary

A method of analyzing film on a substrate comprises receiving surface profile data obtained from measurements of a substrate having a plurality of discrete regions with one or more film layers; extracting, based on a predetermined pattern of the discrete regions, a plurality of parameters from the received surface profile data, the plurality of parameters comprising one or more parameters of a film layer of each discrete regions, and displaying a user interface. The user interface may comprise a plurality of individual graphs each illustrating the one or more parameters of the one or more film layers for a corresponding subset of the plurality of discrete regions, and a composite graph illustrating the one or more parameters of the one or more film layers for each discrete region of the plurality of discrete regions, wherein the composite graph corresponds to the plurality of individual graphs being overlaid together.