Surface-Modified Gas Supply for Substrate Adhesion
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Solution Overview
Problem
In semiconductor manufacturing, pattern collapse occurs when hexamethyl disilazane (HMDS) is not coated on substrates during photo-lithography processes, especially as pattern sizes reach 5 nm or less, requiring a method to enhance adhesion between substrates and photo-resist.
Innovation Solution
An apparatus and method that supply surface-modified gas, specifically a mixture of alkyne-based chemicals and inert gases, to the substrate to improve adhesion, using a bubbler tank to generate and control the concentration of the gas, which is heated to optimize vapor pressure and adhesion efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If HMDS is used for substrate treatment, then adhesion improvement is achieved, but pattern collapse occurs at 5 nm or less pattern sizes
Solution Approach 1:
The patent changes the chemical parameters of the treatment substance by replacing HMDS with surface-modified gases (alcohol-based chemicals like isopropyl alcohol, tert-butyl alcohol, or fluoroalcohol-based gases). This parameter change in chemical composition resolves the pattern collapse issue while maintaining adhesion improvement, as the new chemicals provide different surface modification characteristics suitable for small pattern sizes.
Solution Approach 2:
The patent employs a gas-phase treatment approach where short-lived surface-modified gases are supplied to the substrate. Unlike HMDS which requires coating and can leave residual effects, the gas-phase treatment provides transient surface modification that eliminates pattern collapse. The gases (isopropyl alcohol, tert-butyl alcohol, fluoroalcohol-based gases) act briefly to improve adhesion then dissipate, preventing the harmful effects seen with HMDS.
2Strength
If surface-modified gas is supplied to improve adhesion, then pattern collapse is prevented, but process complexity increases
Solution Approach 1:
The patent utilizes pneumatic delivery systems to supply surface-modified gases (isopropyl alcohol, tert-butyl alcohol, fluoroalcohol-based gases) to the substrate. The gas supply unit employs pressure-controlled flow delivery through bubblers or direct gas injection, using pneumatic principles to achieve uniform distribution. This approach simplifies the system compared to liquid coating mechanisms while effectively improving adhesion and preventing pattern collapse.
Solution Approach 2:
The patent replaces the mechanical coating process of HMDS (which involves liquid application and drying) with a gas-phase delivery system. The mechanical complexity of liquid handling, coating uniformity control, and drying is substituted with simpler gas flow control and pneumatic delivery mechanisms. The surface-modified gases (alcohol-based or fluoroalcohol-based) are delivered via pressure-controlled flow, eliminating the need for complex liquid coating and drying systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively increases the adhesion between the substrate and photo-resist, preventing pattern collapse and enhancing the substrate treatment process, particularly at small pattern sizes.
Implementation Method 1
a heater configured to heat the liquid alkyne-based chemical stored in the bubbler tank at a first temperature
Implementation Method 2
a bubbler tank provided with an accommodating space for storing a liquid alkyne-based chemical and configured to bubble the liquid alkyne-based chemical by supplying inert gas to the accommodating space to generate the surface-modifying gas
Data Source
AI summary
An apparatus for treating the substrate includes a process chamber with a treating space therein, a support member located in the treating space to support the substrate, and a gas supply unit supplying a surface-modifying gas to the treating space. The gas supply unit includes a bubbler tank provided with an accommodating space for storing a liquid alkyne-based chemical, the bubbler tanks bubbling the liquid alkyne-based chemical by supplying an inert gas to the accommodating space to generate the surface-modifying gas, a heater heating the liquid alkyne-based chemical stored in the bubbler tank at a first temperature, and a gas supply line coupled between the process chamber and the bubbler tank to supply the surface modified gas to the treating space and provided with a first valve.