Surface Treatment Agent Prevents Pattern Collapse

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Solution Overview

Problem

The existing methods for preventing pattern collapse during the cleaning process in semiconductor production are insufficient, and silylation treatments using hexamethyl disilazane (HMDS) are time-consuming and may not achieve sufficient hydrophobicity, leading to adhesion issues between resin patterns and substrates.

Innovation Solution

A surface treatment agent containing a silylation agent and a nitrogen-containing heterocyclic compound without silicon atoms is used to increase the hydrophobicity of substrate surfaces, preventing pattern collapse by enhancing the contact angle with cleaning liquids and improving adhesion.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If silylation treatment using HMDS is performed to improve adhesion and prevent pattern collapse, then hydrophobicity of the substrate surface is improved, but treatment time increases and sufficient hydrophobicity may not be achieved

Engineering Contradiction:
Improveadhesion between resin pattern and substrateVSAvoidsilylation treatment time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent changes the chemical parameters of the silylation treatment by replacing HMDS with a silylating agent comprising organometallic compounds (such as alkylaluminum compounds). This parameter change enables sufficient hydrophobicity to be achieved in shorter treatment times while maintaining improved adhesion and preventing pattern collapse during the cleaning process.

Inventive Principle:
Principle #35Parameter changes

2Ease of manufacture

If cleaning liquid is used to clean the substrate after pattern formation, then cleaning effectiveness is improved, but surface tension of the cleaning liquid causes pattern collapse

Engineering Contradiction:
Improvecleaning effectivenessVSAvoidpattern collapse due to surface tension
Core Design Contradiction:
Ease of manufactureVSObject-affected harmful factors

Solution Approach 1:

The patent applies silylation treatment as a preliminary action before the cleaning process. By modifying the substrate surface with hydrophobic silyl groups in advance, the surface is prepared to resist the harmful surface tension effects of cleaning liquids. This preliminary modification prevents pattern collapse during subsequent cleaning operations while maintaining cleaning effectiveness.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The surface treatment effectively prevents pattern collapse and enhances adhesion, reducing the time required for silylation while maintaining high hydrophobicity, thus improving the yield and reliability of semiconductor products.

Implementation Method 1

the surface of the treatment target is highly hydrophobized

Methodology Applied
Scientific EffectHydrophobicity: Hydrophobe

Implementation Method 2

due to the surface tension of this cleaning liquid. In other words, when the cleaning liquid is removed in a drying step, stress based on the surface tension of the cleaning liquid has an effect between patterns

Methodology Applied
Scientific EffectSurface tension: Surface Tension

Implementation Method 3

surface treatment is performed on a surface of a treatment target using a surface treatment agent containing a silylation agent and a nitrogen-containing heterocyclic compound

Methodology Applied
Scientific EffectSilylation: Chemical Bonding

Data Source

PatentUS10093815B2Surface treatment agent and surface treatment method
Publication Date: 2018.10.09 TOKYO OHKA KOGYO CO LTD
  • US10093815B2 patent drawing
  • US10093815B2 patent drawing
  • US10093815B2 patent drawing

AI summary

A surface treatment agent capable of effectively preventing pattern collapse of an inorganic pattern or a resin pattern provided on a substrate, and a surface treatment method using such a surface treatment agent. The surface treatment agent includes a silylation agent and a nitrogen-containing heterocyclic compound which does not include a silicon atom.