Surface Treatment Apparatus for Double-Sided Film Deposition
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Solution Overview
Problem
Existing surface treatment apparatuses require significant redesign to transition from single-sided to double-sided film deposition, leading to inefficiencies in using accumulated film deposition conditions.
Innovation Solution
A surface treatment apparatus design that allows for direct application of single-sided film deposition conditions to double-sided film deposition by coupling multiple single-sided apparatuses, enabling continuous conveyance and treatment of both surfaces without exposing the workpiece to the atmosphere.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a conventional single-sided film deposition apparatus is diverted to a double-sided film deposition apparatus, then double-sided film deposition capability is achieved, but a new design is required and film deposition conditions accumulated in the single-sided apparatus cannot be used
Solution Approach 1:
The patent combines two single-sided film deposition apparatuses into a single double-sided film deposition apparatus by placing them in adjacent chambers that share a common vacuum system and control electronics. This merging approach allows the apparatus to deposit films on both surfaces of a workpiece without requiring a completely new design, thereby preserving accumulated film deposition conditions while achieving double-sided capability.
Solution Approach 2:
The apparatus is designed with universal components that can perform multiple functions: the same vacuum system, heating elements, and control electronics serve both single-sided and double-sided deposition operations. The apparatus can accommodate workpieces in various orientations and perform different deposition patterns (single-sided, double-sided, or sequential) using the same fundamental hardware, eliminating the need for specialized new designs.
2Adaptability or versatility
If a conventional single-sided film deposition apparatus is diverted to a double-sided film deposition apparatus, then double-sided film deposition capability is achieved, but film deposition conditions accumulated in the single-sided apparatus cannot be used as they are
Solution Approach 1:
The patent creates a virtual copy of the single-sided apparatus's control system and parameters within the double-sided apparatus. The accumulated film deposition conditions, process parameters, and calibration data from the single-sided apparatus are replicated and made available for use in the double-sided mode, allowing seamless transition and preserving all accumulated knowledge without loss.
Solution Approach 2:
The control system is designed to be universal, accommodating both single-sided and double-sided deposition operations with the same hardware and software framework. This universality ensures that film deposition conditions accumulated in single-sided operations can be directly applied to double-sided operations without requiring new designs or losing any process information.
3Productivity
If the workpiece is inverted and film deposition is performed again after completing one side, then both surfaces can be treated, but the workpiece is exposed to the atmosphere
Solution Approach 1:
The patent merges two deposition chambers into a single integrated system where a workpiece can be processed on both sides without leaving the vacuum environment. The shared vacuum system maintains continuous vacuum conditions throughout the entire deposition process, eliminating atmospheric exposure while enabling efficient double-sided film deposition through coordinated operation of the two apparatuses.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient and direct application of single-sided film deposition conditions to double-sided film deposition, reducing the need for new design and minimizing exposure to the atmosphere, thus optimizing film deposition processes.
Implementation Method 1
a surface treatment apparatus for depositing a metal catalyst layer, a SiOx film, or the like by cleaning or modifying a surface of a workpiece by using plasma
Implementation Method 2
a surface treatment apparatus for depositing a thin film on a surface of a workpiece by using a sputtering device
Data Source
AI summary
A surface treatment apparatus includes a placement part on which a workpiece is placed, a first housing part, a second housing part, and a conveyance part. The first housing part houses the workpiece placed on the placement part. The second housing part houses the workpiece placed on the placement part. The second housing part includes a surface treatment part performing at least one type of surface treatment. The conveyance part conveys the workpiece placed on the placement part in a longitudinal direction of the first housing part or the second housing part. The surface treatment apparatus performs surface treatment on the workpiece in a state where the second housing part is a single body or in a state where the first housing part and the second housing part are plurally coupled in a conveyance direction of the conveyance part.