Susceptor CF Coating Seals Anodized Layer Cracks
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Solution Overview
Problem
Exposure of base metal due to cracks in the anodized layer of a susceptor during substrate processing leads to the generation of aluminum-containing gases, causing contamination and foreign matter formation on the substrate during plasma treatment.
Innovation Solution
A susceptor coating method involving a fluorocarbon (CF) polymer coating applied within the cracks of the anodized layer to prevent exposure of the base metal, ensuring a stable and contamination-free substrate processing environment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If an anodized layer is formed on the base metal to prevent contamination, then the substrate processing quality is improved, but cracks occur in the anodized layer causing base metal exposure
Solution Approach 1:
The patent applies a CF coating specifically to the cracked regions of the anodized layer through plasma CVD processing. This localized treatment seals the cracks and prevents base metal exposure at critical areas while maintaining the overall structure of the anodized layer. The coating is selectively formed where needed to address the reliability issue without compromising the manufacturing precision achieved by the anodized layer.
Solution Approach 2:
The patent creates a composite structure by combining the anodized layer with a CF (fluorocarbon) coating. The anodized layer provides the primary protective barrier, while the CF coating fills and seals the cracks in the anodized layer. This composite approach integrates two different materials with complementary properties to simultaneously achieve both manufacturing precision and reliability.
2Device complexity
If the base metal is exposed due to cracks, then the anodized layer structure is simpler, but aluminum-containing gases are generated causing contamination
Solution Approach 1:
The patent extracts and removes the harmful aluminum-containing gases generated from exposed base metal by introducing cleaning gas (such as CF4 or C2F6) to react with and eliminate the aluminum contamination. The plasma processing removes aluminum particles and prevents their deposition on substrates, effectively extracting the harmful elements from the system.
Solution Approach 2:
The patent converts the harmful aluminum-containing gases into beneficial byproducts by using fluorocarbon cleaning gas to react with the exposed aluminum. The reaction transforms aluminum particles into volatile aluminum fluoride compounds that can be easily removed, turning the contamination problem into a controlled chemical process that eliminates the harm.
3Object-affected harmful factors
If cleaning gas is used to remove aluminum contamination, then the chamber is cleaner, but gas containing aluminum is generated from exposed base metal
Solution Approach 1:
The patent applies preliminary action by first forming the CF coating to seal the cracks in the anodized layer before substrate processing begins. This preventive measure eliminates the source of aluminum gas generation at the outset, so that subsequent cleaning gas exposure does not produce aluminum-containing contaminants. The cracks are sealed in advance to prevent the harmful reaction chain.
Solution Approach 2:
The patent applies preliminary anti-action by introducing the CF coating as a protective barrier before any contamination can occur. This coating prevents the cleaning gas from contacting the exposed base metal, thereby preemptively blocking the generation of aluminum-containing gases. The anti-action is taken in advance to neutralize the potential harmful interaction between cleaning gas and exposed aluminum.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The CF coating effectively suppresses the exposure of the base metal, enhancing the quality of substrate processing by preventing aluminum contamination and maintaining a clean chamber environment.
Implementation Method 1
a CF coating of polymer provided in the cracks
Implementation Method 2
The anodized layer is a layer formed by anodizing the base metal
Implementation Method 3
the base metal is exposed to cleaning gas containing F to generate AlF
Implementation Method 4
the thus-generated AlF gasifies
Data Source
AI summary
Examples of a susceptor for supporting a substrate includes a base metal formed of aluminum or a material containing aluminum, an anodized layer covering a surface of the base metal and having cracks therein, and a CF coating of polymer provided in the cracks such that the exposure of the base metal is avoided.


