Susceptor Cleaning via Protective Member and Eccentric Pedestal
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Solution Overview
Problem
Conventional cleaning methods for film deposition apparatuses damage the susceptor and fail to ensure uniformity and throughput due to particle adherence and non-uniform film deposition caused by wafer deformation and centrifugal forces.
Innovation Solution
A cleaning method using a protective member on the substrate receiving region of the susceptor, which allows for dry etching with a cleaning gas to remove deposited films without damaging the susceptor, and a film deposition method that uses a pedestal eccentrically positioned to prevent particle adherence and ensure uniform gas flow.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a cleaning gas is supplied to etch a deposited film on the susceptor surface, then the deposited film is removed effectively, but the susceptor surface is damaged by etching
Solution Approach 1:
A protective member is introduced as an intermediary between the cleaning gas and the susceptor surface. The protective member selectively covers regions where etching should occur (deposited film areas) while protecting regions where etching should not occur (susceptor surface). This allows the cleaning gas to remove the deposited film without damaging the susceptor, resolving the contradiction between cleaning effectiveness and susceptor protection.
2Ease of manufacture
If the pedestal is positioned centrally on the susceptor, then the structure is simple and easy to manufacture, but particle adherence occurs due to wafer deformation and centrifugal forces
Solution Approach 1:
The pedestal is positioned eccentrically (asymmetrically) relative to the susceptor center, specifically offset toward the inner peripheral side. This asymmetric positioning changes the gas flow pattern and reduces centrifugal force effects on the wafer during rotation, preventing wafer deformation and particle adherence. The asymmetric design resolves the contradiction by prioritizing reliability over manufacturing simplicity.
3Productivity
If the susceptor is cleaned without a protective member, then the process is simple and fast, but uniformity of film deposition is compromised due to susceptor damage
Solution Approach 1:
The protective member serves as a mediator that enables effective cleaning while preserving susceptor integrity. By selectively protecting the susceptor surface during cleaning, the protective member maintains the precision of the susceptor surface, which in turn ensures uniform film deposition in subsequent processes. This resolves the contradiction between cleaning productivity and film deposition uniformity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively removes deposited films without damaging the susceptor, maintains uniformity and throughput, and extends the life of the susceptor by preventing etching of the pedestal and ensuring consistent film deposition across the wafer surface.
Implementation Method 1
removing a film deposited on a surface of the susceptor by etching
Data Source
AI summary
A cleaning method for dry cleaning a susceptor disposed in a process chamber of a film deposition apparatus is provided. In the method, a protective member is placed on a substrate receiving region provided in the susceptor. A cleaning gas is supplied to the susceptor having the protective member placed on the substrate receiving region, thereby removing a film deposited on a surface of the susceptor by etching.