Susceptor Gap Control Using In-Situ Optical Measurement
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Solution Overview
Problem
The existing semiconductor processing techniques require an iterative and time-consuming process to adjust the gapping and spacing between the susceptor and the pre-heat ring, which can lead to contamination and limited temperature control, resulting in inconsistent deposition processes and material waste.
Innovation Solution
Implementing a dynamic adjustment system using detectors like lasers or cameras to measure gapping and spacing in real-time, with a control system instructing motors to make precise adjustments, allowing for in-situ adjustments without disturbing the vacuum, enabling more accurate and rapid temperature control during deposition processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If iterative manual adjustment of gapping and spacing is used, then manufacturing precision can be achieved, but production time increases and contamination risk increases
Solution Approach 1:
The patent replaces manual mechanical adjustment with an automated motor-driven positioning system. Motors are integrated into the susceptor assembly to dynamically adjust gapping and spacing between the susceptor and pre-heat ring, eliminating the need for iterative manual adjustments while maintaining precision control throughout the deposition process.
Solution Approach 2:
The patent implements a feedback control system using detectors (such as lasers or cameras) to measure gapping and spacing in real-time. The control system receives detector input and automatically adjusts motor positions to maintain optimal parameters, enabling closed-loop control that ensures manufacturing precision without time-consuming manual iterations.
2Manufacturing precision
If iterative adjustment process is used, then manufacturing precision can be achieved, but contamination increases
Solution Approach 1:
The patent performs preliminary measurement and adjustment of gapping and spacing parameters before the deposition process begins. The motor positioning system pre-configures optimal parameters based on stored data or real-time measurements, eliminating the need for adjustments during the process that would compromise the vacuum environment and introduce contamination.
Solution Approach 2:
The automated motor-driven system eliminates manual intervention during deposition, replacing iterative mechanical adjustments with a single initial configuration. This prevents contamination by keeping the vacuum environment undisturbed throughout the process while maintaining precision through automated control.
3Manufacturing precision
If dynamic adjustment system with detectors and motors is implemented, then temperature control precision improves, but device complexity increases
Solution Approach 1:
The patent integrates multiple functions into unified components: the motor system simultaneously controls both gapping and spacing parameters, the detectors serve both measurement and feedback control functions, and the control system manages both positioning and temperature regulation. This multi-functionality reduces overall system complexity despite the advanced capabilities provided.
Solution Approach 2:
The system performs self-adjustment through automated feedback control. The detectors continuously monitor gapping and spacing, and the control system automatically commands motor adjustments without external intervention. This self-service capability simplifies operation and reduces the need for complex external control mechanisms.
4Productivity
If in-situ adjustments are made without disturbing vacuum, then productivity improves, but measurement precision becomes more difficult
Solution Approach 1:
The patent replaces physical mechanical measurement methods with non-contact optical detection. Lasers or cameras measure gapping and spacing parameters through the vacuum environment without requiring physical access or disturbance of the vacuum, enabling accurate in-situ measurements that maintain both productivity and measurement precision.
Solution Approach 2:
The patent introduces optical intermediaries (lasers or cameras) that can transmit measurement signals through the vacuum environment. These intermediaries enable measurement without direct physical contact or vacuum disturbance, solving the conflict between maintaining vacuum integrity and achieving accurate measurements during deposition.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces production time, minimizes material waste, and decreases the likelihood of contamination, leading to more consistent epitaxial growth and reduced wafer damage, thereby improving the efficiency and quality of semiconductor processing.
Implementation Method 1
a pre-heat ring that surrounds the susceptor and that is configured to heat the wafer
Implementation Method 2
a motor configured to move the susceptor vertically, laterally, or a combination thereof
Data Source
AI summary
In some implementations, a control device may determine a spacing measurement in a first dimension between a wafer on a susceptor and a pre-heat ring of a semiconductor processing tool and/or a gapping measurement in a second dimension between the wafer and the pre-heat ring, using one or more images captured in situ during a process by at least one optical sensor. Accordingly, the control device may generate a command based on a setting associated with the process being performed by the semiconductor processing tool and the spacing measurement and/or the gapping measurement. The control device may provide the command to at least one motor to move the susceptor.