Overlap Susceptor and Preheat Ring for Gas Flow Separation
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Solution Overview
Problem
Existing processing chambers suffer from gas exchange between process and purge gas flows, leading to dilution of process gas, undesirable material deposition, and poor deposition uniformity, which affects film quality and tool uptime.
Innovation Solution
The implementation of an overlapping susceptor and preheat ring design, combined with a vented liner and dynamic pressure balancing, prevents gas exchange between upper and lower chamber volumes by exhausting purge gas directly from the lower portion and regulating pressure differentials.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If purge gas flow is used in the lower portion of the chamber to prevent process gas diffusion, then process gas contamination is reduced, but gas exchange between process and purge gas flows occurs causing dilution and deposition uniformity issues
Solution Approach 1:
The chamber is segmented into distinct upper and lower regions with separate gas flow paths. The susceptor and preheat ring create a physical barrier that divides the chamber volume, allowing independent control of process gas flow in the upper region and purge gas flow in the lower region, preventing harmful gas exchange while maintaining deposition uniformity
Solution Approach 2:
The susceptor and preheat ring act as intermediary structures that physically separate the process gas and purge gas flows. These components serve as mediators that prevent direct mixing between the two gas streams while still allowing thermal energy transfer to occur, thus eliminating gas exchange problems without compromising the heating function
2Manufacturing precision
If gas exchange between process and purge gas flows is prevented, then deposition uniformity improves, but gas flow control complexity increases
Solution Approach 1:
The susceptor and preheat ring are combined into a single integrated component structure. This merging of functions into one piece eliminates the need for separate gas flow control mechanisms for distinct components, simplifying the overall gas flow control system while maintaining effective separation of process and purge gas streams
Solution Approach 2:
The susceptor-preheat ring assembly serves multiple functions simultaneously: it acts as a substrate holder, a preheating element, and a gas flow separation barrier. This multi-functionality reduces the number of separate components needed for gas flow control, thereby reducing system complexity while achieving the goal of preventing gas exchange
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enhances deposition process uniformity and tool uptime by preventing gas dilution and material deposition, improving film quality and extending maintenance intervals.
Implementation Method 1
a pressure differential between an upper portion of the chamber and a lower portion of the chamber
Implementation Method 2
Portions of the susceptor and preheat ring are radially overlapping
Data Source
AI summary
Embodiments disclosed herein generally provide improved control of gas flow in processing chambers. In at least one embodiment, a liner for a processing chamber includes an annular body having a sidewall and a vent formed in the annular body for exhausting gas from inside to outside the annular body. The vent comprises one or more vent holes disposed through the sidewall. The liner further includes an opening in the annular body for substrate loading and unloading.