Susceptor Purge Gas Channel Layout for Uniform Wafer-Edge Flow
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Solution Overview
Problem
Existing susceptors face issues with non-uniform purge gas flow and crack formation due to radial purge gas channels with varying lengths and branching points, leading to inefficiencies and structural weaknesses during press joining.
Innovation Solution
A susceptor design with a symmetrical purge gas channel structure, including an internal channel and radial branch channels, aligned with the shaft joint, to ensure uniform gas flow and prevent cracking, while minimizing heat transfer to the shaft.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Shape
If radial purge gas channels are used to ensure symmetry with respect to the center of the plate, then symmetry is improved, but uniform gas flow is worsened due to different channel lengths from the shaft-side channel
Solution Approach 1:
The purge gas channel is segmented into multiple independent channels (first purge gas channel and second purge gas channel) that branch off at different positions from the shaft-side channel. This segmentation allows each channel to have optimized characteristics, with the first channel having a smaller cross-sectional area than the second channel, enabling uniform gas flow distribution despite radial symmetry requirements.
2Ease of operation
If multiple radial channels branch off at specific points where channels connect with the shaft, then gas distribution is improved, but crack formation is worsened due to high pressure during press joining
Solution Approach 1:
The channel cross-sectional areas are locally optimized at different positions. The first purge gas channel has a smaller cross-sectional area than the second purge gas channel, creating local quality variations that reduce stress concentration at branching points. This local optimization prevents crack formation during press joining while maintaining effective gas distribution throughout the system.
3Ease of manufacture
If the internal channel is aligned with the connecting portion of the shaft, then assembly is improved, but heat transfer from the plate to the shaft is increased
Solution Approach 1:
The purge gas channels act as an intermediary barrier between the heating element layer and the shaft. By positioning the internal channel to conform to the connecting portion of the shaft and having purge gas flow through this intermediate path, thermal contact between the plate and shaft is reduced, minimizing heat transfer to the shaft while maintaining proper alignment for assembly.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The design achieves uniform purge gas distribution around the wafer edge, reduces crack formation during assembly, and minimizes heat loss from the heating element to the shaft, enhancing process efficiency and structural integrity.
Implementation Method 1
a purge gas channel is needed to supply purge gas to an edge of a wafer to suppress localized non-uniform deposition of the thin film at the wafer's edge
Implementation Method 2
a susceptor may be installed in a CVD apparatus and a PVD apparatus and include a heater plate having an embedded heating element to support and heat a substrate
Implementation Method 3
the susceptor may be equipped with a radio-frequency (RF) electrode instead of or in addition to the heating element to be used for plasma formation in an etching process or the like for thin film layers on the substrate
Data Source
AI summary
Disclosed is a susceptor including a purge gas channel for supplying purge gas. The present disclosure provides a susceptor including: a plate having a heating element layer embedded therein; and a hollow shaft joined to a bottom of the plate, wherein the plate includes a purge gas channel layer disposed on a plane different from that of the heating element layer, and the purge gas channel layer includes an internal channel and multiple radial branch channels extending outward from the internal channel.