Susceptor Runout and Wobble Fixture for Ex-Situ Qualification
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Solution Overview
Problem
Semiconductor processing systems face challenges in achieving uniform film deposition due to runout and wobble of susceptor assemblies, which are difficult to control through existing manufacturing tolerances and in-situ adjustments, leading to prolonged system qualification and installation processes.
Innovation Solution
A fixture with a base, turntable, and sensors (first and second sensors) is provided to measure ex-situ runout and wobble of susceptor assemblies, using non-contact laser displacement sensors to determine radial and axial displacements, allowing for precise adjustments and simplifying the qualification process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If piece part-level manufacturing tolerances and in-situ adjustments are used to control runout and wobble, then film uniformity is improved, but system qualification time and complexity increase
Solution Approach 1:
The patent applies preliminary action by performing runout and wobble measurements ex-situ (before installation) using a dedicated measurement fixture. This allows susceptor assemblies to be pre-qualified and adjusted prior to system installation, eliminating the need for time-consuming in-situ qualification and adjustment procedures after the semiconductor processing system is installed.
Solution Approach 2:
The patent replaces complex mechanical in-situ adjustment procedures with a simplified measurement and selection process. Instead of requiring mechanical adjustments within the reaction chamber, the system uses optical/laser-based measurement fixtures to quantify runout and wobble, allowing for non-destructive evaluation and pre-screening of susceptor assemblies.
2Manufacturing precision
If piece part-level manufacturing tolerances are applied to control runout and wobble, then susceptor assembly precision is improved, but tolerance stack-up prevents successful adjustment
Solution Approach 1:
The patent introduces an intermediary measurement fixture that serves as a reference standard for evaluating susceptor assembly runout and wobble. This fixture provides a stable, precision-referenced measurement platform that decouples the evaluation process from the complex tolerance interactions within the susceptor assembly itself, allowing for objective assessment without being affected by tolerance stack-up issues.
3Manufacturing precision
If in-situ adjustment of susceptor assembly is performed during system installation, then runout and wobble are reduced, but qualification process is prolonged
Solution Approach 1:
The patent applies preliminary action by performing runout and wobble measurements ex-situ (before installation) using a dedicated measurement fixture. This allows susceptor assemblies to be pre-qualified and adjusted prior to system installation, eliminating the need for time-consuming in-situ qualification and adjustment procedures after the semiconductor processing system is installed.
4Measurement precision
If ex-situ measurement fixture is used to determine runout and wobble, then measurement accuracy is improved, but fixture complexity increases
Solution Approach 1:
The patent replaces complex mechanical in-situ adjustment procedures with a simplified measurement and selection process. Instead of requiring mechanical adjustments within the reaction chamber, the system uses optical/laser-based measurement fixtures to quantify runout and wobble, allowing for non-destructive evaluation and pre-screening of susceptor assemblies.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The fixture enables accurate measurement and adjustment of susceptor assemblies, reducing runout and wobble, thereby improving film uniformity and streamlining the semiconductor processing system qualification and installation processes.
Implementation Method 1
The first sensor is fixed relative to the base, is radially offset from the rotation axis, and is configured to determine ex-situ runout of the susceptor assembly
Implementation Method 2
The second sensor is fixed relative to the first sensor, is axially offset from the first sensor, and is configured to determine ex-situ wobble of the susceptor assembly
Data Source
AI summary
A fixture is provided. The fixture includes a base, a turntable, a first sensor, and a second sensor. The turntable is supported on the base, is rotatable about a rotation axis, and is configured to slidably seat a susceptor assembly for rotation about the rotation axis. The first sensor is fixed relative to the base, is radially offset from the rotation axis, and is configured to determine ex-situ runout of the susceptor assembly. The second sensor is fixed relative to the first sensor, is axially offset from the first sensor, and is configured to determine ex-situ wobble of the susceptor assembly. Fixture arrangements and methods of determining ex-situ runout and ex-situ wobble of susceptor assemblies for semiconductor processing systems are also described.