Swing-Arm Beam Alignment for Rotating Substrate Processing

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Solution Overview

Problem

The use of a swing stage in substrate processing apparatuses poses challenges in precisely aligning a desired point on the photomask with a laser beam due to spatial constraints and contamination risks, making it difficult to achieve high precision and uniformity in semiconductor device production.

Innovation Solution

A control device is implemented to calculate the target point on a substrate by converting image coordinates from a first coordinate system to a second coordinate system based on the rotation angles of the spin head and the swing arm, allowing for precise alignment and correction of the critical dimension of the photomask.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If a swing stage is used instead of a conventional X/Y stage, then spatial constraints are resolved and contamination risk is reduced, but coordinate calculation precision and alignment accuracy deteriorate

Engineering Contradiction:

Improvespatial adaptabilityVSAvoidcoordinate calculation precision

Core Design Contradiction:

Adaptability or versatilityVSMeasurement precision

Solution Approach 1:

The system performs preliminary coordinate transformation by converting image coordinates to swing stage coordinates before the alignment process. This pre-calculation approach prepares the coordinate system in advance, allowing the swing stage to operate in its optimized spatial configuration without compromising alignment precision.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

An intermediate coordinate transformation layer is introduced between the image coordinate system and the swing stage coordinate system. The control device acts as an intermediary that converts coordinates through multiple steps (image coordinates → swing stage coordinates → corrected coordinates), resolving the precision issue while maintaining the swing stage's spatial advantages.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Object-affected harmful factors

If a swing stage is used instead of a conventional X/Y stage, then spatial constraints are resolved and contamination risk is reduced, but alignment accuracy deteriorates

Engineering Contradiction:

Improvecontamination riskVSAvoidalignment accuracy

Core Design Contradiction:

Object-affected harmful factorsVSManufacturing precision

Solution Approach 1:

The system replaces complex mechanical alignment mechanisms with a computational coordinate transformation approach. By using mathematical conversion formulas to calculate target point coordinates in the swing stage coordinate system, the system achieves high alignment accuracy without relying on complex mechanical adjustment mechanisms, thereby maintaining low contamination risk.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The system changes the parameter representation from direct mechanical positioning to calculated coordinate transformation. By transforming the alignment problem from a mechanical positioning task to a computational coordinate conversion task, the system maintains alignment accuracy while preserving the contamination-free advantages of the swing stage design.

Inventive Principle:

Principle #35Parameter changes

3Measurement precision

If coordinate conversion from first coordinate system to second coordinate system is implemented, then target point calculation precision is improved, but computational complexity increases

Engineering Contradiction:

Improvetarget point calculation precisionVSAvoidcontrol system complexity

Core Design Contradiction:

Measurement precisionVSDevice complexity

Solution Approach 1:

The coordinate transformation process is segmented into distinct stages: image coordinate extraction, swing stage coordinate conversion, and target point calculation. The control device executes these steps sequentially, breaking down the complex transformation into manageable segments that improve precision while keeping computational complexity organized and controllable.

Inventive Principle:

Principle #1Segmentation

Data Source

PatentUS20250065360A1Control device and substrate processing apparatus including the same

Publication Date: 2025.02.27 SAMSUNG ELECTRONICS CO LTD

AI summary

A control device and a substrate processing apparatus including the same are provided. The substrate processing apparatus includes: a support unit including a spin head and configured to support and to rotate a substrate; a spraying unit configured to spray processing liquid onto the substrate; a correction unit in a swing arm, the correction unit configured to move to a target point on the substrate and to irradiate a beam when the processing liquid is sprayed onto the substrate; and a control unit configured to calculate the target point, wherein the control unit is configured to convert image coordinates associated with a first coordinate system and then to calculate the target point by converting the image coordinates associated with the first coordinate system into image coordinates associated with a second coordinate system, and the second coordinate system is based on rotation angles of the spin head and the swing arm.