Swing Arm Position Correction for Mask Etching Dead Zones
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Solution Overview
Problem
The existing equipment for correcting critical dimensions of masks in photolithography processes often experiences a dead zone due to misalignment of the swing arm's movement trajectory with the spin chuck's rotation center, leading to errors in etching.
Innovation Solution
A control device is used to correct the absolute position error of the swing arm's rotation motor by employing an anchor pattern on a second substrate, generating an error correction model through Fourier transformation, extracting fitting parameters, and performing curve fitting to adjust the swing arm's position.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the swing arm's movement trajectory does not pass through the rotation center of the spin chuck, then the equipment can be operated, but a dead zone that cannot be etched occurs on the mask
Solution Approach 1:
The system performs preliminary measurement using anchor patterns before the actual etching process. The controller measures the position of anchor patterns on the mask to detect trajectory deviation, then pre-calculates correction values to compensate for the dead zone issue before etching begins
Solution Approach 2:
The system implements a feedback mechanism where the controller continuously monitors the swing arm's movement trajectory by detecting anchor pattern positions, compares the actual trajectory with the ideal trajectory, and automatically adjusts the movement parameters to eliminate the dead zone and ensure complete etching coverage
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively aligns the swing arm's movement trajectory with the spin chuck's rotation center, eliminating the dead zone and improving the precision of the etching process.
Implementation Method 1
generate an error correction model by Fourier transforming a function related to a swing direction error of the swing arm according to a rotation angle of the swing arm
Data Source
AI summary
Provided is a control device and a substrate processing apparatus including the same. The substrate processing apparatus includes a support unit configured to support and rotate a first substrate, the support unit including a spin chuck, a spray unit configured to spray a processing fluid on the first substrate, a correction unit on a swing arm and configured to irradiate a beam onto the first substrate when the processing fluid is provided on the first substrate, wherein the swing arm is adjacent to the spin chuck and is configured to move the correction unit to a target point on the first substrate, and a controller configured to control the spin chuck and the swing arm, and correct a position error of the swing arm using a second substrate, wherein a plurality of anchor patterns are on the second substrate.