Swing Arm Trajectory Alignment in Substrate Processing
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Solution Overview
Problem
In photolithography processes, equipment used to correct the critical dimension of masks or reticles often experiences a non-etchable dead zone due to the swing arm's movement trajectory not aligning with the rotation center of the spin chuck, leading to inefficiencies in pattern correction.
Innovation Solution
A control device and substrate processing apparatus that utilize a centering jig to ensure the swing arm's movement trajectory aligns with the spin chuck's rotation center, incorporating a sensor and emitter for image processing and correction unit to adjust the trajectory accordingly.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a swing arm is used for CD correction equipment, then spatial constraints and contamination risks are addressed, but a non-etchable dead zone occurs on the mask when the movement trajectory does not pass through the rotation center
Solution Approach 1:
The system uses a vision system to capture images of the mask during swing arm movement, processes these images to calculate the actual movement trajectory, and provides feedback to the control unit. The control unit then adjusts the swing arm's movement parameters to ensure the trajectory passes through the rotation center, eliminating dead zones and improving correction precision.
Solution Approach 2:
The patent replaces purely mechanical trajectory control with an integrated system combining vision sensing, image processing, and adaptive control. The vision system and image processing algorithms substitute for traditional mechanical alignment methods, enabling dynamic trajectory correction and ensuring precise passage through the rotation center.
2Manufacturing precision
If the swing arm movement trajectory does not pass through the rotation center, then a non-etchable dead zone occurs, but adjusting the trajectory requires complex alignment mechanisms
Solution Approach 1:
The vision system serves as an intermediary between the swing arm mechanical system and the control system. It captures trajectory information, enables precise measurement without complex mechanical alignment mechanisms, and facilitates automated adjustment through image processing and control algorithms.
Solution Approach 2:
The system creates a digital copy of the physical trajectory through image capture and processing. By working with image data rather than directly manipulating mechanical components, the system simplifies the alignment process and enables precise trajectory control through software-based adjustments.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution prevents the occurrence of dead zones by accurately aligning the swing arm's trajectory with the spin chuck's center, enhancing the precision and effectiveness of pattern correction in photolithography processes.
Implementation Method 1
the emitter configured to irradiate a beam towards the substrate
Implementation Method 2
the correction unit configured to irradiate a beam, via the emitter, towards the substrate and acquire a plurality of images, via the sensor
Implementation Method 3
rescale each of the plurality of images based on brightness; extract enlarged images of a first hole by binarizing the plurality of images, that are rescaled, using a threshold
Implementation Method 4
calculate a center-of-mass position of the first hole from each of the enlarged images that are extracted; perform circle fitting on the center-of-mass position of the first hole
Data Source
AI summary
A substrate processing apparatus is provided and includes: a support unit including a spin chuck and a centering jig that is on the spin chuck, the spin chuck configured to support and rotate a substrate; a spraying unit configured to spray processing liquid onto the substrate; a swing arm including a correction unit that includes a sensor and an emitter, the swing arm configured to move such that the correction unit moves to a target point on the substrate, and the emitter configured to irradiate a beam towards the substrate; and a controller configured to: control the spin chuck and the swing arm; and determine whether a movement trajectory of the swing arm is aligned with a rotation center of the spin chuck based on information acquired by the sensor about the centering jig.