SWIR Focus Averaging for Patterned Substrate Inspection

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Solution Overview

Problem

Existing SWIR inspection systems struggle to precisely detect the locations of features on patterned substrates due to varying optimal foci across different SWIR wavelengths, especially in high-magnification applications, and implementing multiple image capture devices is costly and inefficient.

Innovation Solution

A SWIR inspection system using focus averaging generates multiple SWIR waves of varying wavelengths through a common optical fiber, combining them with a single image sensor to create a focus-averaged image, controlled by a controller that synchronizes wave generation with substrate motion to improve scanning throughput and image quality.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If multiple image capture devices are used to capture images at different SWIR wavelengths, then detection accuracy is improved, but device complexity and cost increase

Engineering Contradiction:
Improvedetection accuracyVSAvoiddevice complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent combines multiple image capture devices into a single device that can detect multiple SWIR wavelengths simultaneously. This is achieved by using a single imaging sensor with optical filters or a tunable filter system that allows the same sensor to capture images at different wavelengths, thereby maintaining detection accuracy while reducing device complexity and cost.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The single image capture device is designed to perform multiple functions by capturing images across different SWIR wavelengths. The device incorporates wavelength-selective optical elements that enable it to detect various wavelengths using the same sensor, making it a universal imaging device that replaces what would traditionally require multiple specialized devices.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Measurement precision

If multiple image capture devices are used to capture images at different SWIR wavelengths, then detection accuracy is improved, but manufacturing cost increases

Engineering Contradiction:
Improvedetection accuracyVSAvoidmanufacturing cost
Core Design Contradiction:
Measurement precisionVSEase of manufacture

Solution Approach 1:

The patent merges the functionality of multiple expensive image capture devices into a single, more cost-effective device. By using one imaging sensor with wavelength-selective optical filters instead of multiple dedicated sensors, the system significantly reduces manufacturing costs while preserving the ability to detect features across different SWIR wavelengths with high accuracy.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

Instead of purchasing and deploying multiple physical image capture devices, the patent uses a single device that replicates the functionality of multiple devices through software-controlled optical filtering. The same sensor captures images at different wavelengths by sequentially applying different optical filters, creating a cost-effective copy of what would otherwise require multiple hardware devices.

Inventive Principle:
Principle #26Copying

3Measurement precision

If focus is optimized for each SWIR wavelength, then image quality is improved, but scanning throughput decreases due to the need for multiple focus adjustments

Engineering Contradiction:
Improveimage qualityVSAvoidscanning throughput
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The patent performs preliminary focus optimization for all SWIR wavelengths before the actual inspection process. By pre-determining the optimal focus settings for each wavelength and storing these calibration data, the system eliminates the need for real-time focus adjustments during scanning, thereby maintaining high image quality across all wavelengths while maximizing scanning throughput.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent implements a dynamic focus adjustment mechanism that automatically switches between pre-calibrated focus settings based on the currently active wavelength. The system dynamically selects the appropriate focus value from stored calibration data corresponding to the wavelength being used, enabling rapid wavelength switching without mechanical focus adjustments, thus preserving both image quality and scanning speed.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enhances focus margin and detection accuracy while reducing costs by using a single image capture device, enabling more effective imaging and inspection of patterned substrates with improved scanning throughput and image quality.

Implementation Method 1

generates multiple SWIR waves of varying wavelengths through a common optical fiber

Methodology Applied
Scientific EffectOptical fiber wave transmission: Optical Fibre

Implementation Method 2

a SWIR imaging system including an optical system and at least one image capture device operatively coupled with at least one image sensor

Methodology Applied
Scientific EffectSWIR imaging: Infrared Radiation

Implementation Method 3

inspect the patterned substrate by focus averaging a plurality of images of the patterned substrate. Each image of the plurality of images corresponds to a respective SWIR wavelength

Methodology Applied
Scientific EffectFocus averaging:

Data Source

PatentUS20250278028A1Shortwave infrared inspection of patterned substrates using focus averaging
Publication Date: 2025.09.04 APPLIED MATERIALS INC
  • US20250278028A1 patent drawing
  • US20250278028A1 patent drawing
  • US20250278028A1 patent drawing

AI summary

A system includes a memory and at least one processing device, operatively coupled with the memory, to obtain metrology data with respect to a substrate, cause a lithography process to be performed using the metrology data to obtain a patterned substrate to be processed, and after performing the lithography process, cause a shortwave infrared (SWIR) inspection system to inspect the patterned substrate by focus averaging a plurality of images of the patterned substrate. Each image of the plurality of images corresponds to a respective SWIR wavelength of a plurality of SWIR wavelengths.