Swirl Gas Nozzle for Uniform Substrate Coating
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Solution Overview
Problem
Existing substrate treating apparatuses face challenges in achieving uniform coating of treatment gases like HMDS across large substrates, leading to uneven adhesive functions due to non-uniform gas distribution.
Innovation Solution
A substrate treating apparatus with a gas flow path featuring a swirl chamber, diameter contraction chamber, and diameter expansion chamber, which generates a swirl flow that restricts and then relieves the circling radius of the treatment gas, ensuring uniform distribution across the substrate through centrifugal force, enhancing coverage from the center to the periphery.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a vertical pipe is connected to the gas introduction port, then the treatment gas can be supplied to the substrate, but uneven coating with HMDS occurs between one part of the substrate immediately below the gas introduction port and the other part of the substrate
Solution Approach 1:
The gas introduction port is divided into multiple separate gas introduction ports arranged in a specific pattern on the cover. Instead of using a single vertical pipe that creates localized gas flow, multiple ports distribute the treatment gas across different regions of the substrate, ensuring uniform coating throughout the entire substrate surface.
2Quantity of substance
If a horizontal pipe is connected to the gas introduction port via an elbow pipe, then the treatment gas can be supplied to the substrate, but uneven coating with HMDS occurs between one part of the substrate immediately below the gas introduction port or another part of the substrate extending in one direction from the part, and the other part of the substrate
Solution Approach 1:
The gas introduction system is segmented into multiple ports distributed across the cover rather than using a single horizontal pipe with elbow connections. This segmentation eliminates the directional bias introduced by elbow pipes and ensures treatment gas reaches all substrate regions uniformly from multiple directions.
3Area of stationary object
If a substrate having a large size is used, then the substrate can accommodate more processing, but a long distance by which the treatment gas flows on the substrate leads to an increased area to which the treatment gas is supplied, causing more uneven coating with the HMDS
Solution Approach 1:
Multiple gas introduction ports are arranged in a specific pattern across the cover to segment the gas supply into multiple zones. This allows treatment gas to reach all areas of large substrates through direct, short paths from various ports, eliminating the long single-path flow that causes non-uniform coating on large substrates.
Solution Approach 2:
Different regions of the cover are equipped with gas introduction ports at strategically located positions to provide localized gas supply to different substrate areas. This ensures that even distant regions of large substrates receive adequate treatment gas flow, maintaining coating uniformity across the entire substrate surface.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves a more uniform supply of treatment gas to the entire substrate surface, improving adhesive functionality by ensuring consistent coating, even on larger substrates.
Implementation Method 1
The swirl chamber allows the treatment gas to flow in a swirl manner (in a helical manner) around the central axis... The treatment gas discharged from the gas flow path flows downward, and spreads outward in a substantially horizontal direction by a centrifugal force
Data Source
AI summary
Substrate treating apparatus including a cover that covers a substrate on a plate. The cover undersurface is substantially horizontal and adjacent to a surface of the substrate. Through a gas flow path, a treatment gas is supplied to the substrate. The gas flow path includes a swirl chamber, a diameter contraction chamber, and a diameter expansion chamber. In the swirl chamber, the treatment gas flows around the central axis. The diameter contraction chamber is disposed below and in communication with the swirl chamber, and has an inner diameter that decreases from its upper end toward its lower end. The diameter expansion chamber is disposed below and in communication with the diameter contraction chamber, and has an inner diameter that increases from its upper end toward its lower end. The lower end of the diameter expansion chamber includes an opening on the undersurface of the cover.