Switchable Electron Reflector Array for Maskless Lithography
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Solution Overview
Problem
Conventional electron beam lithography processes, both direct write and projection, face inefficiencies due to high costs associated with mask production and time-consuming sequential writing in direct write methods, and the need for multiple masks in projection lithography, making them economically unfeasible for small-scale, customer-specific circuit production.
Innovation Solution
A dynamic pattern generator system utilizing an array of switchable multiple-electrode electron reflectors that can configure to reflect electrons in focused or defocused modes, allowing for maskless reflection electron beam projection lithography, which reduces the need for physical masks and enhances throughput by controlling electron beam reflection to optimize pattern generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional electron beam projection lithography is used to achieve high throughput by imaging a whole field simultaneously, then productivity is improved, but device complexity increases due to the need for physical masks for each structure
Solution Approach 1:
The patent extracts and eliminates the physical mask component from the electron beam projection lithography system. Instead of using traditional masks, the invention employs a dynamic pattern generator with an array of electron reflectors that can be electronically controlled to define patterns, thereby removing the need for mask fabrication and handling while maintaining projection lithography throughput
Solution Approach 2:
The patent implements a dynamic pattern generator where electron reflectors can be dynamically switched between reflective and non-reflective states through voltage control. This dynamic switching capability allows patterns to be changed electronically without physical mask changes, enabling high throughput production of customer-specific circuits in small numbers
2Adaptability or versatility
If electron beam reflectors are made switchable between reflective and non-reflective modes, then adaptability is improved for different circuit patterns, but device complexity increases due to multiple electrodes and control circuitry
Solution Approach 1:
The patent makes each electron reflector multi-functional by equipping it with multiple electrodes that can generate different electric field configurations. The same reflector structure can produce reflective, non-reflective, and focused modes, eliminating the need for separate components for each function and reducing overall system complexity despite the added electrode capability
Solution Approach 2:
The patent controls the switching behavior of electron reflectors by changing electrical parameters (voltage levels and configurations) applied to the electrodes. By adjusting these parameters, the reflectors can be dynamically switched between different operational modes, providing adaptability without mechanical moving parts or complex structural changes
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system enables higher throughput and reduced costs by eliminating the need for multiple masks and improving the efficiency of electron beam reflection, making it economically viable for small-scale, customer-specific circuit production while maintaining high resolution.
Implementation Method 1
A dynamic pattern generator system utilizing an array of switchable multiple-electrode electron reflectors that can configure to reflect electrons in focused or defocused modes
Implementation Method 2
charged particle beams have been used for high resolution lithographic resist exposure. In particular, electron beams have been used since the low mass of electrons allows relatively accurate control of an electron beam
Data Source
AI summary
One embodiment relates to a method of controllably reflecting electrons from an array of electron reflectors. An incident electron beam is formed from an electron source, and the incident beam is directed to the array of electron reflectors. A first plurality of the reflectors is configured to reflect electrons in a first reflective mode such that the reflected electrons exiting the reflector form a focused beam. A second plurality of the reflectors is configured to reflect electrons in a second reflective mode such that the reflected electrons exiting the reflector are defocused. Another embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. Other embodiments, aspects and features are also disclosed.