Switchable Energy Analysis Slit for Ion Implanter Precision
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Solution Overview
Problem
Existing ion implanters face a trade-off between energy precision and productivity due to the design of the energy analysis slit, where narrowing the slit width improves precision but reduces the ion beam passing through, affecting the implantation process.
Innovation Solution
An ion implanter with a radio frequency linear accelerator, an energy analysis magnet, and a switchable energy analysis slit assembly that allows for both standard and high-precision slit openings, enabling the adjustment of acceleration parameters to maintain target beam current while enhancing energy precision.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the slit width of the energy analysis slit is narrowed to improve energy precision, then the implantation energy precision is improved, but the amount of ion beam passing through the slit is reduced, lowering productivity
Solution Approach 1:
The energy analysis slit is divided into multiple independent slits (first energy analysis slit, second energy analysis slit, third energy analysis slit) with different widths. This segmentation allows selective use of different slit configurations - narrow slits for high precision measurements and wide slits for high productivity implantation, resolving the contradiction between precision and productivity.
Solution Approach 2:
The system dynamically switches between different slit configurations based on operational requirements. The slit selection is not fixed but adaptable - using narrow slits when energy precision is critical and wide slits when productivity is the priority, making the system flexible to resolve the precision-productivity tradeoff.
2Measurement precision
If the slit width is narrowed to achieve higher energy precision, then the energy resolution is improved, but the beam current amount passing through is reduced
Solution Approach 1:
Multiple slits with different widths are provided to handle different measurement needs. Narrow slits (second and third energy analysis slits) are used when high energy resolution is required, while the first energy analysis slit with wider opening is used when higher beam current is needed, thus resolving the contradiction between resolution and beam current.
Solution Approach 2:
The system changes the physical parameter of slit width to match different operational requirements. By selecting appropriate slit width from multiple options, the system optimizes the balance between energy resolution and beam current transmission based on the specific task at hand.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration improves energy precision while maintaining productivity by allowing the ion implanter to switch between slit openings, optimizing the beam current and energy distribution for precise ion implantation.
Implementation Method 1
a radio frequency linear accelerator that accelerates supplied ions in accordance with an acceleration parameter
Implementation Method 2
an energy analysis magnet that is arranged downstream of the radio frequency linear accelerator and that generates an ion deflecting magnetic field in a vertical direction perpendicular to a beam traveling direction
Data Source
AI summary
An energy analysis slit of an ion implanter is configured to enable switching between a standard slit opening used for implantation processing performed under a predetermined implantation condition and a high-precision slit opening having higher energy precision than the standard slit opening and used to tune an acceleration parameter for a radio frequency linear accelerator. The acceleration parameter is determined for the predetermined implantation condition so that at least a part of ions supplied to the radio frequency linear accelerator is accelerated to have target energy, and so that the beam current amount measured by a beam measurement unit is equivalent to a target beam current amount.