Switchable Multi-Frequency RF Power Supply for Plasma Chambers

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Solution Overview

Problem

Existing RF power supply systems for plasma chambers are costly and unreliable due to the need for multiple RF power suppliers, which are expensive to maintain and amplify, especially when generating multiple frequencies for controlling ion energy and plasma density.

Innovation Solution

A single RF power supply system that uses multiple RF signal generators to combine, amplify, and separate RF signals, allowing for switchable multiple-frequency RF power output, reducing the number of amplifiers and DC power suppliers needed, and incorporating a matching circuitry to efficiently couple the RF power to the plasma chamber.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If multiple individual RF power suppliers are used to generate multiple frequencies for plasma chamber control, then the plasma chamber can control ion energy and plasma density, but the system cost and complexity increase significantly

Engineering Contradiction:
Improvefrequency control capabilityVSAvoidnumber of RF power suppliers
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent combines multiple RF power suppliers into a single integrated RF power supply system that can generate multiple frequencies simultaneously. This single system includes multiple oscillators, frequency multipliers/dividers, and power amplifiers that work together to provide the required frequency versatility while reducing overall system complexity and cost.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The RF power supply system is designed as a universal platform that can generate multiple frequencies (e.g., 2 MHz, 13 MHz, 27 MHz, 60 MHz) and power levels from a single device. This multi-functional system replaces multiple specialized RF power suppliers, providing adaptability for different plasma processing requirements without increasing device complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Adaptability or versatility

If multiple RF power suppliers are used to provide different frequencies, then various ion species dissociation can be controlled, but the maintenance cost and system reliability deteriorate

Engineering Contradiction:
Improveion species controlVSAvoidsystem reliability
Core Design Contradiction:
Adaptability or versatilityVSReliability

Solution Approach 1:

By merging multiple RF power suppliers into a single integrated system with shared power amplifiers and control electronics, the patent reduces the number of independent components that could fail. This consolidation improves system reliability while maintaining the capability to control different ion species through frequency selection.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The system includes redundancy design where backup oscillators and frequency generation circuits are integrated into the single RF power supply. When one frequency generation path fails, the system can switch to alternative paths without requiring external backup equipment, thereby recovering functionality and maintaining reliability.

Inventive Principle:
Principle #34Discarding and recovering

3Power

If multiple RF power suppliers are used to amplify multiple frequencies, then the RF power can be provided for plasma chamber operation, but the cost and complexity of amplification systems increase

Engineering Contradiction:
ImproveRF power outputVSAvoidamplifier system complexity
Core Design Contradiction:
PowerVSDevice complexity

Solution Approach 1:

The patent merges multiple frequency-specific amplifiers into a single wide-band power amplifier that can amplify multiple frequencies simultaneously. This single amplifier receives signals from multiple oscillators and frequency multipliers, providing the required RF power output for plasma chamber operation while significantly reducing amplifier system complexity.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The power amplifier is designed as a universal component with wide bandwidth capability that can amplify signals across multiple frequency ranges (MHz to hundreds of MHz). This multi-functional amplifier replaces multiple narrow-band amplifiers, reducing device complexity while maintaining the ability to provide sufficient RF power for various plasma processing modes.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS7503996B2Multiple frequency plasma chamber, switchable RF system, and processes using same
Publication Date: 2009.03.17 ADVANCED MICRO FAB EQUIP INC CHINA
  • US7503996B2 patent drawing
  • US7503996B2 patent drawing
  • US7503996B2 patent drawing

AI summary

An RF power supplier is provided, that enables multiple-frequency RF power. The system uses N RF signal generators, combines the RF signals, amplify the combined signals, and then separates the amplified signal. The output of the system is then a multiple-frequency RF power. Optionally, the frequencies are switchable, so that one may select which frequencies the system outputs.