Symmetric Coil Coupling for Direct-Drive RF Plasma Power

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Solution Overview

Problem

Conventional plasma processing systems require RF signals to be transmitted through RF cables and impedance matching networks, which can lead to inefficiencies and limitations in controlling RF power delivery to plasma processing chambers.

Innovation Solution

A plasma processing system utilizing symmetrically coupled direct-drive RF power supplies that generate shaped-amplified square waveforms, transformed into shaped-sinusoidal signals by reactive circuits, to directly deliver RF power to a coil without the need for RF cables and impedance matching networks, allowing precise control of RF power delivery.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of energy

If RF signals are transmitted through RF cables and impedance matching networks, then RF power can be delivered to plasma processing chambers, but transmission inefficiencies and control limitations occur

Engineering Contradiction:
ImproveRF power transmission efficiencyVSAvoidControl of RF power delivery
Core Design Contradiction:
Loss of energyVSEase of operation

Solution Approach 1:

The patent extracts and eliminates the RF cables and impedance matching networks from the conventional RF power transmission system. By using direct-drive RF power supplies connected directly to the plasma processing chamber, the system removes the intermediate transmission components that cause energy loss and control limitations, achieving both improved efficiency and control precision

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent introduces reactive circuits as intermediary components that transform shaped-amplified square waveforms into shaped-sinusoidal signals. These reactive circuits serve as mediators between the direct-drive RF power supplies and the plasma processing chamber, enabling efficient power delivery without requiring conventional RF transmission infrastructure

Inventive Principle:
Principle #24Intermediary (Mediator)

2Device complexity

If conventional RF transmission methods are used, then plasma processing chambers can be powered, but system complexity increases due to additional components

Engineering Contradiction:
ImproveNumber of RF transmission componentsVSAvoidRF power delivery reliability
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The patent removes RF cables and impedance matching networks from the system, directly connecting the RF power supplies to the plasma processing chamber. This extraction of unnecessary components reduces device complexity while simultaneously improving reliability by eliminating potential failure points in the transmission path

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent merges the RF power generation and delivery functions into a more integrated system. The direct-drive RF power supplies are connected directly to the chamber, combining what were previously separate functions (power generation, cable transmission, impedance matching) into a streamlined configuration that is both simpler and more reliable

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables efficient and controlled transformation of process gases into plasma within the plasma processing chamber, enhancing the processing capabilities of semiconductor wafers by eliminating inefficiencies in RF power transmission.

Implementation Method 1

The first reactive circuit is configured to transform the first shaped-amplified square waveform signal into a first shaped-sinusoidal signal in route to the first end of the coil

Methodology Applied
Scientific EffectReactive circuit transformation:

Implementation Method 2

RF power transmitted from the electrode causes a process gas to be transformed into a plasma within the plasma generation chamber

Methodology Applied
Scientific EffectPlasma generation: Plasma

Data Source

PatentUS12482634B2Symmetric coupling of coil to direct-drive radiofrequency power supplies
Publication Date: 2025.11.25 LAM RES CORP
  • US12482634B2 patent drawing
  • US12482634B2 patent drawing
  • US12482634B2 patent drawing

AI summary

A coil is disposed next to a plasma processing chamber. A first direct-drive radiofrequency (RF) power supply has an output through which a first shaped-amplified square waveform signal is transmitted. A first reactive circuit is connected between the output of the first direct-drive RF power supply and a first end of the coil. The first reactive circuit transforms the first shaped-amplified square waveform signal into a first shaped-sinusoidal signal in route to the first end of the coil. A second direct-drive RF power supply has an output through which a second shaped-amplified square waveform signal is transmitted. A second reactive circuit is connected between the output of the second direct-drive RF power supply and a second end of the coil. The second reactive circuit transforms the second shaped-amplified square waveform signal into a second shaped-sinusoidal signal in route to the second end of the coil.