Tangential Injection Pipes for Uniform ALD Gas Distribution
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Solution Overview
Problem
Current atomic layer deposition apparatuses face issues with uneven gas flow distribution, precursor reactions leading to dust and pipe blockages, and limited space for precursor pipes due to the single or double-pipe design, resulting in unstable processes and reduced deposition quality.
Innovation Solution
A deposition apparatus with injection pipes tangent to the chamber's inner surface, allowing process gases to rotate and form cyclones for uniform distribution, and accommodating multiple pipes to prevent precursor reactions, enhancing gas uniformity and increasing the deposition area.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single-pipe or double-pipe design is used for precursor injection, then the device structure is simple, but the gas flow distribution in the chamber is not uniform resulting in uneven deposited layer thickness
Solution Approach 1:
The injection system is divided into multiple independent pipes, each dedicated to a specific precursor. This segmentation prevents precursor mixing in the injection channel and enables independent control of each precursor's flow and injection timing, resulting in uniform gas distribution and consistent deposited layer thickness across the chamber.
Solution Approach 2:
Each injection pipe is equipped with localized heating elements and temperature control mechanisms tailored to the specific precursor it carries. This local quality approach ensures optimal vaporization and flow characteristics for each precursor without affecting others, maintaining precise control over deposition uniformity while managing the complexity of multiple pipes.
2Device complexity
If multiple precursors are injected through the same flow channel, then the device structure is simple, but the precursors react with each other producing dust that blocks the pipe
Solution Approach 1:
The flow channel system is segmented into separate independent pipes for each precursor. This physical separation eliminates the possibility of precursor reactions within the injection channels, preventing dust formation and pipe blockages while maintaining structural simplicity through modular design.
Solution Approach 2:
The harmful interaction between precursors is extracted and eliminated by separating their transport paths. Each precursor is extracted into its own dedicated flow channel, removing the source of dust-generating reactions while preserving the essential function of precursor delivery.
3Temperature
If heating devices or insulating jackets are installed on precursor pipes to maintain temperature, then the precursor can be kept warm, but the overall outer diameter of the pipes is greatly increased congesting the chamber space
Solution Approach 1:
The heating function is merged with the pipe structure itself rather than being added as a separate external component. The pipes are designed with integrated heating elements or insulating layers that are part of the pipe wall, maintaining precursor temperature while minimizing the increase in outer diameter and preserving chamber space.
Solution Approach 2:
Thin insulating jackets or heating films are applied to the pipe surface, providing necessary thermal insulation and temperature maintenance with minimal thickness. This approach maintains the compact size of the pipes while ensuring proper thermal management of the precursors.
4Device complexity
If gas is injected from a single point in the chamber, then the injection structure is simple, but the process gas concentration is excessively different throughout the chamber
Solution Approach 1:
The single-point gas injection is segmented into multiple injection points distributed throughout the chamber. Each precursor has its own injection pipe positioned at different locations, creating a distributed injection system that ensures uniform process gas concentration across the entire chamber volume.
Solution Approach 2:
The injection system transitions from a single-point (0D) or single-line (1D) approach to a multi-point spatial distribution (3D). Multiple injection pipes are positioned at different heights and locations around the chamber, creating a three-dimensional gas distribution network that eliminates concentration gradients and ensures uniformity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design achieves uniform gas distribution, prevents pipe blockages, and increases the deposition area, leading to improved process stability and throughput.
Implementation Method 1
a nozzle of an injection pipe is tangent to an inner side surface of a chamber, such that a process gas ejected through the nozzle of the injection pipe can rotate along the inner side surface of the chamber in a tangential direction to form a random annular cyclone in the chamber
Implementation Method 2
The plasma device is disposed in and passes through a top of the chamber, and is configured to generate plasma within the chamber to activate the precursor gas to form an activator
Data Source
AI summary
A deposition apparatus includes a chamber, a susceptor, several injection pipes, and a plasma device. The susceptor is disposed within the chamber and is configured to carry a substrate. The injection pipes are respectively disposed in and pass through an upper portion of the chamber and are located over the susceptor. A nozzle of each of the injection pipes is tangent to an inner side surface of the chamber, so that several process gases ejected through the nozzles of the injection pipes respectively rotate along the inner side surface of the chamber. The process gases at least include a precursor gas. The plasma device is disposed in and passes through a top of the chamber, and is configured to generate plasma within the chamber to activate the precursor gas to form activators.