Tank Cleaning Nozzle for Substrate Liquid Treatment Apparatus
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Solution Overview
Problem
In substrate liquid treatment apparatuses, the tank used for storing processing liquid becomes contaminated due to particles adhering to its inner wall surface after used processing liquid is returned from the substrate processing units, leading to inefficient cleaning processes.
Innovation Solution
A substrate liquid treatment apparatus is designed with a cleaning nozzle that discharges a cleaning liquid onto the inner wall surface of the tank, utilizing the existing circulation line and processing liquid to efficiently clean the tank, thereby removing contaminants without the need for an exclusive cleaning liquid or additional pumping systems.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the tank is cleaned by discharging cleaning liquid from a cleaning nozzle onto the inner wall surface, then the cleaning efficiency is improved, but the device complexity increases due to additional cleaning components
Solution Approach 1:
The circulation line is designed to serve dual purposes: transporting processing liquid during normal operation and supplying cleaning liquid during cleaning operations. The cleaning nozzle utilizes the existing circulation pump and piping infrastructure, eliminating the need for separate cleaning pumps and reducing overall system complexity while maintaining high cleaning efficiency
Solution Approach 2:
The system uses its own circulation line and pump to provide cleaning functionality, allowing the tank cleaning operation to be performed using the existing processing liquid circulation infrastructure. This self-service approach avoids adding external cleaning systems and reduces device complexity
2Productivity
If an exclusive cleaning liquid is used for tank cleaning, then the cleaning effectiveness is improved, but the loss of substance increases due to consumption of specialized cleaning chemicals
Solution Approach 1:
The system recycles the cleaning liquid back through the circulation line after it contacts the tank inner wall, allowing the cleaning liquid to be reused multiple times. This recovery approach reduces the loss of cleaning substance compared to traditional methods where cleaning liquid is discharged after single-use
Solution Approach 2:
The circulation line and pump are used for both processing liquid transport and cleaning liquid supply, eliminating the need for exclusive cleaning chemical systems. The same infrastructure serves multiple functions, reducing substance loss associated with specialized cleaning agents
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method effectively cleans the tank's inner surface using the processing liquid, reducing costs and equipment complexity while efficiently removing contaminants, ensuring the tank remains clean and operational for subsequent substrate processing.
Implementation Method 1
a cleaning nozzle that discharges a cleaning liquid onto an inner wall surface of the tank to clean the inner wall surface by the cleaning liquid
Data Source
AI summary
In one embodiment, a substrate liquid treatment apparatus includes: a tank that stores a processing liquid; a circulation line connected to the tank, through which circulation line a circulation flow of the processing liquid that leaves the tank and then returns back to the tank; a processing unit that processes a substrate by supplying the processing liquid, distributed from the circulation line, to the substrate; a return line that returns, to the tank, the processing liquid discharged from the processing unit after being supplied to the substrate; a cleaning nozzle that discharges a cleaning liquid onto an inner wall surface of the tank to clean the inner wall surface by the cleaning liquid; and a cleaning line that supplies the cleaning liquid to the cleaning nozzle.