Tantalum-Coated Atomizing Core for Dry-Heat Corrosion Resistance
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Solution Overview
Problem
Existing atomizing cores lack resistance to both dry-heating and wet-heating, leading to a short service life due to high-temperature electrochemical corrosion and dry-heating failures.
Innovation Solution
An atomizing core with a tantalum thin-film on the heating film, made of elemental metal or alloy with a melting point of 1400°C or more and resistivity of less than 5×10−7 Ωm, providing a resistance at least five times that of the heating film, and a protective layer made of materials like aluminum oxide or silicon oxynitride.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If thin-film type heating films are used to replace conventional thick films, then atomizing efficiency is improved and material consistency is enhanced, but the heating film becomes susceptible to dry-heating failure and high-temperature electrochemical corrosion
Solution Approach 1:
The patent applies composite materials by combining the thin-film heating layer with a corrosion-resistant substrate layer. The heating film (300-5000 nm thick) is deposited on a substrate containing corrosion-resistant materials, creating a composite structure that maintains the thin-film's high atomizing efficiency while adding protection against dry-heating failure and electrochemical corrosion. This composite approach allows the system to achieve both improved productivity and enhanced reliability.
2Temperature
If the heating film operates at high temperatures (300°C or more), then atomizing performance is improved, but the metal heating film becomes susceptible to high-temperature electrochemical corrosion
Solution Approach 1:
The patent uses the substrate as an intermediary layer between the heating film and the corrosive environment. The substrate contains corrosion-resistant materials that act as a barrier, protecting the metal heating film from direct contact with corrosive substances in the e-liquid. This intermediary structure allows the heating film to operate at high temperatures (300°C or more) for improved atomizing performance while the substrate shields it from high-temperature electrochemical corrosion, thereby enhancing reliability.
3Stability of the object's composition
If the heating film is made thinner to improve material consistency, then atomizing efficiency is enhanced, but the film becomes more vulnerable to corrosion and dry-heating damage
Solution Approach 1:
The patent creates a composite structure where a thin heating film (maintaining good material consistency) is combined with a corrosion-resistant substrate. The thin heating film layer provides consistent heating characteristics for enhanced atomizing efficiency, while the substrate layer compensates for the reduced thickness by providing mechanical strength and corrosion protection. This composite approach resolves the contradiction by allowing the heating film to be thin enough for material consistency while the substrate ensures reliability against corrosion and dry-heating damage.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The atomizing core exhibits strong resistance to both dry-heating and wet-heating, significantly prolonging its service life by preventing high-temperature electrochemical corrosion and maintaining low resistance.
Implementation Method 1
the resistance of the tantalum thin-film is at least five times the resistance of the heating film
Implementation Method 2
atomizing is implemented by energizing the heating film for heating (where the potential difference is usually around 3 to 4 V)
Implementation Method 3
Tantalum is one of the most chemically stable metal, and easily forms a layer of passive film on the surface, which has a very high resistance to electrochemical corrosion
Data Source
AI summary
The present disclosure provides an atomizing core, including a substrate, where a heating film is provided on the substrate. A tantalum thin-film is provided on the surface of the heating film away from the substrate. The heating film is made of elemental metal or an alloy material having a melting point of 1400° C. or more, and a resistivity of less than 5×10−7 Ωm. The resistance of the tantalum thin-film is at least five times the resistance of the heating film.

