Tapered Conductive Pattern with Titanium Nitride Capping

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Solution Overview

Problem

In display devices, conductive patterns with low-resistance materials like aluminum face challenges due to material damage during manufacturing processes such as annealing and etching, leading to signal delays and reliability issues, especially in high-resolution displays.

Innovation Solution

A conductive pattern is formed with a capping layer made of multiple component layers, including titanium nitride, which prevents metal diffusion and surface damage during cleaning and etching processes, ensuring the reliability of low-resistance conductive patterns by controlling taper angles and using specific etching conditions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of time

If a low-resistance material like aluminum is used for signal wirings, then signal delay is reduced, but the material becomes susceptible to damage during manufacturing processes such as annealing and etching

Engineering Contradiction:
Improvesignal delayVSAvoidprocess reliability
Core Design Contradiction:
Loss of timeVSReliability

Solution Approach 1:

A capping layer made of titanium nitride is introduced as an intermediary between the aluminum signal wiring and the manufacturing environment. This capping layer protects the aluminum from damage during annealing and etching processes while allowing the aluminum to maintain its low-resistance properties for signal transmission.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The conductive pattern is formed as a composite structure combining aluminum (for low resistance) with titanium nitride capping layers (for protection). This composite approach allows each material to fulfill its optimal function - aluminum provides low-resistance signal transmission while titanium nitride provides manufacturing process protection.

Inventive Principle:
Principle #40Composite materials

2Productivity

If a capping layer with large taper angle is used, then etching speed is improved, but insulating material cannot be properly filled in the vicinity of the side surface

Engineering Contradiction:
Improveetching speedVSAvoidinsulating material filling
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The taper angle of the capping layer is optimized to a specific range (20° to 40°) that balances etching speed with insulating material filling capability. This parameter optimization ensures that the etching process proceeds efficiently while allowing insulating material to be properly deposited in the side surface region.

Inventive Principle:
Principle #35Parameter changes

3Stability of the object's composition

If titanium is used as the first capping component layer, then diffusion prevention is achieved, but the material reacts with fluoric acid during cleaning processes

Engineering Contradiction:
Improvediffusion preventionVSAvoidsurface damage from cleaning
Core Design Contradiction:
Stability of the object's compositionVSObject-affected harmful factors

Solution Approach 1:

Titanium nitride is used as the first capping component layer directly contacting the aluminum, providing both diffusion prevention and chemical inertness to fluoric acid cleaning solutions. Titanium may be used in subsequent layers where diffusion prevention is less critical but other properties are needed.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution significantly reduces signal delay and improves display quality by maintaining low resistance and reliability of conductive patterns, even in high-resolution organic light emitting diode displays.

Implementation Method 1

the first capping component layer disposed on the main conductive layer and including titanium nitride, thereby preventing or mitigating the diffusion of the metal components at the interface with the main conductive layer

Methodology Applied
Scientific EffectDiffusion barrier: Diffusion Barrier

Implementation Method 2

since titanium nitride does not easily react with fluoric acid or the like compared to titanium, the surface of the main conductive layer may be protected during a cleaning process

Methodology Applied
Scientific EffectChemical resistance:

Data Source

PatentUS11063110B2Conductive pattern with tapered angle, display device including the same, and method of manufacturing conductive pattern
Publication Date: 2021.07.13 SAMSUNG DISPLAY CO LTD
  • US11063110B2 patent drawing
  • US11063110B2 patent drawing
  • US11063110B2 patent drawing

AI summary

A conductive pattern for a display device includes a first layer including aluminum or an aluminum alloy disposed on a substrate and forming a first taper angle with the substrate, and a second layer disposed on the first layer forming a second taper angle with the first layer, in which the second taper angle is smaller than the first taper angle.