Tapered Diffuser for Uniform Gas Delivery in Cross-Flow Reactors
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Solution Overview
Problem
Conventional gas-phase reactors, such as cross-flow reactors, suffer from non-uniform film thickness deposition on substrates due to fixed diffuser designs that result in uneven gas flow velocity profiles, leading to material buildup along the edges of the substrate.
Innovation Solution
A diffuser design with a variable separation distance between top and bottom surfaces, featuring a tapered structure that redirects gas flow to the center, ensuring uniform material distribution across the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional constant diffuser design is used, then the device complexity is low, but the manufacturing precision of film thickness is poor due to non-uniform material distribution
Solution Approach 1:
The diffuser transitions from a static constant geometry design to a dynamic variable geometry design where the separation distance changes along the flow direction. This dynamic structure allows the diffuser to adaptively control gas flow velocity and pressure distribution, creating a more uniform flow profile that improves film thickness uniformity on the substrate.
Solution Approach 2:
The diffuser geometry parameter (separation distance between top and bottom surfaces) is changed from a constant value to a variable value that changes along the flow direction. This parameter change enables continuous adjustment of flow characteristics, transforming the flow velocity profile from non-uniform to more uniform distribution, thereby improving deposition uniformity.
2Manufacturing precision
If a conventional diffuser with fixed geometry is used, then the ease of manufacture is high, but the deposition uniformity deteriorates due to edge buildup
Solution Approach 1:
The diffuser is segmented into multiple zones along the flow direction, with each zone having a different separation distance. This segmentation allows independent optimization of flow control in different regions, enabling precise control over gas distribution patterns to achieve uniform deposition while managing manufacturing complexity through modular design approaches.
Solution Approach 2:
The diffuser design adds a gradient dimension to the previously two-dimensional constant geometry. By introducing variation in the separation distance along the flow direction, the design transforms from a simple planar structure to a three-dimensional graded structure, enabling superior flow control and deposition uniformity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The diffuser design achieves more uniform material application on the substrate, reducing material buildup at the edges and enhancing deposition consistency.
Implementation Method 1
processing material flowing through the diffuser turns at the wall and enters the reaction chamber
Implementation Method 2
Gas-phase reactors, such as chemical vapor deposition (CVD) reactors, including, for example atomic layer deposition (ALD) reactors
Data Source
AI summary
Diffuser includes a top surface and a bottom surface that extend from an inlet to a wall. The top and the bottom are separated by a separation distance. The separation distance includes at least a first separation distance at the inlet of the diffuser and a second separation distance at the wall such that the first separation distance is greater than the second separation distance. That is, at least a part of the top surface is tapered.