Tapered Source-Drain Electrode Field-Effect Transistor Mobility

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Solution Overview

Problem

Conventional field-effect transistors produced using a coating process exhibit insufficient mobility and high mobility variation due to the geometry of the source/drain electrodes, particularly when these electrodes form large angles with the substrate in their cross-section parallel to the channel length direction.

Innovation Solution

The source/drain electrodes are designed with a taper shape in their cross-section parallel to the channel length direction and perpendicular to the substrate, with a taper angle of 70° or less, to improve mobility and reduce variation, using a semiconductor material formed through a coating process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If the source/drain electrode forms a large angle with the substrate in cross-section, then the electrode coverage area is increased, but the mobility and uniformity of the semiconductor layer are deteriorated due to void generation at the interface

Engineering Contradiction:
Improveelectrode coverage areaVSAvoidmobility uniformity
Core Design Contradiction:
Area of stationary objectVSManufacturing precision

Solution Approach 1:

The patent changes the geometric parameters of the electrode by introducing a taper angle constraint (70° or less), which optimizes the interface geometry between electrode and semiconductor layer. This parameter modification prevents void formation while maintaining adequate coverage area, thereby improving mobility uniformity without sacrificing electrode functionality.

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If the source/drain electrode has a tapered shape with small taper angle, then the mobility and mobility uniformity are improved, but the electrode coverage area is reduced

Engineering Contradiction:
Improvemobility uniformityVSAvoidelectrode coverage area
Core Design Contradiction:
Manufacturing precisionVSArea of stationary object

Solution Approach 1:

The patent establishes an optimal range for the taper angle (70° or less) that balances two competing requirements: achieving sufficient mobility uniformity by preventing void formation, and maintaining adequate electrode coverage area for functional performance. This parameter optimization resolves the contradiction between precision and area.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS8969871B2Field-effect transistor, processes for producing the same, and electronic device using the same
Publication Date: 2015.03.03 MITSUBISHI CHEM CORP
  • US8969871B2 patent drawing
  • US8969871B2 patent drawing
  • US8969871B2 patent drawing

AI summary

Provided is a field-effect transistor which has a high mobility and a low variation of mobility.A field-effect transistor at least comprising a substrate, a semiconductor layer, a source electrode, and a drain electrode is produced by forming the source electrode and/or the drain electrode so that the source electrode and/or the drain electrode has a taper shape in a cross-section which is parallel with a channel length direction and perpendicular to the substrate, and forming the semiconductor layer through coating process.