Tapered Reactor Injector for Tight Vertical Furnace Clearances
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Solution Overview
Problem
The challenge in vertical processing furnaces is fitting an elongated injector within a small space between the process tube and the wafer boat, especially when a liner is present, due to tight tolerances, which complicates controlling the position of the injector's second end.
Innovation Solution
The injector is designed with a tapered shape towards its second end, occupying less space and relaxing positioning tolerances, and is made from materials with similar thermal expansion to the deposited film to minimize stress and breakage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the injector is made longer to increase the number of wafers in the reaction chamber, then productivity is improved, but the difficulty of positioning the injector's second end in the small space between the process tube and wafer boat increases
Solution Approach 1:
The injector's geometric parameters are changed by introducing a tapered shape at the second end, reducing its cross-sectional dimensions in the critical positioning zone. This allows the injector to fit into the smaller gap between the process tube and wafer boat, enabling longer injector lengths for increased wafer capacity while maintaining ease of positioning.
2Reliability
If a liner is provided along the inside surface of the process tube to protect the tube, then the tube's reliability is improved, but the tolerance for fitting the injector becomes tighter
Solution Approach 1:
The injector's dimensional parameters are modified with a tapered design at the second end, reducing its size in the region where it must pass through the narrow gap between the liner and wafer boat. This parameter change accommodates the reduced clearance caused by the liner while maintaining reliable fitting.
3Productivity
If the injector is made longer to process more wafers, then productivity is improved, but the space occupied by the injector in the reaction chamber increases
Solution Approach 1:
The injector employs a tapered geometry at its second end, reducing the cross-sectional area in the region where space is constrained. This allows the injector to extend longer for increased wafer capacity while occupying less volume in the critical space between the process tube and wafer boat.
Data Source
AI summary
An injector configured for arrangement within a reactor of a vertical furnace to inject gas in the reactor is provided. The injector is made substantial elongated and configured with an internal gas conduction channel to transport gas from a first end of the injector to a second end of the injector. An outer sidewall of the injector may be tapered towards the second end over at least 10%, preferably 30% and most preferably 50% of the length of the injector to increase tolerances for fitting the injector in the tube.