Target Material Priming and Transport for High-Purity EUV Supply

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Solution Overview

Problem

Current semiconductor lithography processes face challenges in efficiently supplying target materials, particularly in maintaining purity and continuous flow of target materials like tin in extreme ultraviolet (EUV) light production, where non-target materials can contaminate the system and disrupt the high-purity requirements.

Innovation Solution

An apparatus and method involving a reservoir system, priming system, and transport system that includes a removable carrier, dual-valve assembly, and pressure control mechanisms to separate and purify the target material, ensuring it is supplied in a fluid state while trapping non-target materials, maintaining pressures below atmospheric levels, and controlling temperature to prevent contamination.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If a continuous flow of target material is maintained in the transport system, then productivity is improved, but non-target materials can contaminate the system and disrupt purity requirements

Engineering Contradiction:
Improvecontinuous flow of target materialVSAvoidpurity of target material
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent extracts and removes non-target materials from the transport system through dedicated removal mechanisms. The system continuously extracts unwanted materials from the target material stream, maintaining purity while allowing continuous flow of target material to proceed to the EUV light source.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The transport system acts as an intermediary between the target material supply and the EUV light source. It introduces purification mechanisms that mediate the flow, separating target from non-target materials while maintaining continuous operation and protecting the downstream system from contamination.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If pressure is maintained below atmospheric levels in the transport system, then target material purity is preserved, but system complexity increases due to vacuum maintenance requirements

Engineering Contradiction:
Improvetarget material purityVSAvoidpressure control system
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The system segments the pressure control into distinct zones - the transport system maintains sub-atmospheric pressure while other portions of the system operate at different pressures. This segmentation allows vacuum maintenance only where necessary for purity, reducing overall system complexity.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Sub-atmospheric pressure is applied locally only in the transport system portion where target material flows, rather than throughout the entire system. This localized pressure control maintains purity where needed while minimizing the complexity and cost of vacuum maintenance.

Inventive Principle:
Principle #3Local quality

3Productivity

If temperature is controlled to maintain target material in fluid state, then continuous supply is enabled, but energy consumption increases

Engineering Contradiction:
Improvecontinuous supply of target materialVSAvoidtemperature control energy
Core Design Contradiction:
ProductivityVSUse of energy by moving object

Solution Approach 1:

The system maintains continuous heating of the transport system to keep target material in fluid state throughout operation. This continuous thermal action eliminates the need for repeated melting cycles, reducing overall energy consumption while enabling uninterrupted supply to the EUV light source.

Inventive Principle:
Principle #20Continuity of useful action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution ensures continuous, high-purity supply of target materials by effectively separating and trapping non-target materials, maintaining system purity, and enabling efficient EUV light production without disrupting the operational environment.

Implementation Method 1

maintaining pressures below atmospheric levels

Methodology Applied
Scientific EffectPressure gradient: Pressure Gradient

Implementation Method 2

controlling temperature to prevent contamination

Methodology Applied
Scientific EffectThermal control: Heating

Implementation Method 3

dual-valve assembly

Methodology Applied
Scientific EffectFluid flow control: Valve

Data Source

PatentUS11988967B2Target material supply apparatus and method
Publication Date: 2024.05.21 ASML NETHERLANDS BV
  • US11988967B2 patent drawing
  • US11988967B2 patent drawing
  • US11988967B2 patent drawing

AI summary

An apparatus for supplying a target material includes a reservoir system, a priming system, and a transport system that extends from the priming system to the reservoir system. The reservoir system includes a reservoir in fluid communication with a nozzle supply system. The priming system includes a priming chamber defining a primary cavity; and a removable carrier configured to be received in the primary cavity. The removable carrier defines a secondary cavity configured to receive a solid matter that includes the target material. The transport system is configured to provide a fluid flow path between the priming system and the reservoir system.