Target Positioning Device for Charged Particle Beam Lithography
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Solution Overview
Problem
Current charged particle beam lithography systems lack suitable target positioning devices that are optimized for vacuum compatibility and electromagnetic field shielding, leading to inaccuracies and high costs in maskless lithography processes.
Innovation Solution
A target positioning device utilizing flexures and piezoelectric elements to maintain precise alignment and movement of the target within the charged particle beam exposure system, while shielding the system from external electromagnetic fields using μ-metal shielding and strategically placing actuators outside the vacuum chamber to minimize interference.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If electromagnetic actuators are used for target positioning, then positioning capability is improved, but electromagnetic field interference with charged particle beams worsens
Solution Approach 1:
The electromagnetic actuator is extracted from the vacuum chamber environment and placed externally, connected to the target carriage through a flexible coupling. This separates the source of electromagnetic fields from the sensitive charged particle beam region, eliminating interference while maintaining positioning capability through the flexible connection that accommodates vacuum boundary conditions.
Solution Approach 2:
A flexible coupling serves as an intermediary between the electromagnetic actuator and the target carriage mounted on the linear base. This intermediary transmits mechanical motion while being compatible with vacuum environment requirements, allowing the actuator to remain outside the vacuum chamber while still controlling the target position accurately.
2Adaptability or versatility
If conventional stages are adapted for maskless lithography, then system compatibility is improved, but performance and cost-effectiveness worsen
Solution Approach 1:
The target positioning system is segmented into distinct functional modules: a linear base providing the foundation, a target carriage mounted on the linear base for holding and positioning the target, and an electromagnetic actuator for drive. This modular segmentation allows each component to be optimized for its specific function while ensuring overall system compatibility and performance.
Solution Approach 2:
The system employs a dynamic configuration where the target carriage can move along the linear base under actuator control, allowing adaptive positioning during lithography operations. The flexible coupling enables dynamic motion transmission while maintaining vacuum integrity, providing both adaptability and reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides a cost-effective and accurate target positioning system that reduces electromagnetic field interference, ensuring precise beam alignment and stability during the lithography process, enhancing the overall efficiency and reliability of the charged particle beam exposure system.
Implementation Method 1
A target positioning device utilizing flexures and piezoelectric elements to maintain precise alignment and movement of the target
Implementation Method 2
shielding the system from external electromagnetic fields using μ-metal shielding
Data Source
Figure 1
Figure 2~3
Figure 4A~4B
AI summary
The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.