Target Supply Unit Vacuum Segmentation for EUV Stability
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Solution Overview
Problem
In EUV light generation systems, dielectric breakdowns occur when high voltages are applied between the target material and electrodes, leading to unstable voltage conditions and difficulty in controlling the trajectory of charged targets, which affects the stable supply of targets to the plasma generation region.
Innovation Solution
A target supply unit with a discharge device that pumps out gas from the space between the nozzle unit and the electrode, increasing the withstand voltage and suppressing dielectric breakdowns, thereby stabilizing the voltage and ensuring stable target supply.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If high voltage is applied between the target material and electrode to control trajectory, then trajectory control capability is improved, but dielectric breakdown occurs causing voltage instability
Solution Approach 1:
The patent divides the chamber into two distinct pressure zones: a high-vacuum region containing the electrode and target material, and a lower-vacuum region containing the gas discharge zone. This spatial segmentation allows high voltage to be applied in the vacuum region without dielectric breakdown, while maintaining gas flow control capabilities in the discharge region.
Solution Approach 2:
The patent introduces a partition wall with a discharge hole as an intermediary structure between the two pressure zones. This mediator enables controlled gas flow from the high-vacuum region to the discharge region while maintaining pressure differential, preventing dielectric breakdown in the high-voltage zone while allowing trajectory control through electric fields.
2Productivity
If gas is present in the space between nozzle unit and electrode, then target material can be supplied, but dielectric breakdown occurs at high voltage
Solution Approach 1:
The chamber is segmented into a high-vacuum target supply region and a lower-vacuum discharge region, allowing gas to be present in the discharge region for target supply while maintaining vacuum conditions in the high-voltage region to prevent dielectric breakdown.
Solution Approach 2:
Different vacuum levels are maintained in different regions of the chamber: high vacuum in the electrode region for dielectric strength, and controlled gas presence in the discharge region for target material supply, achieving local optimization of both requirements.
3Reliability
If vacuum is maintained in the chamber, then dielectric breakdown is suppressed, but target material trajectory control becomes difficult
Solution Approach 1:
The system segments the chamber into zones with different vacuum levels, allowing vacuum maintenance in the high-voltage region for dielectric strength while introducing gas in the discharge region to enable target material trajectory control through discharge effects.
Solution Approach 2:
The patent adds a spatial dimension to the solution by creating multiple pressure zones within the same chamber, allowing simultaneous satisfaction of conflicting requirements in different spatial regions rather than compromising overall conditions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively suppresses dielectric breakdowns, maintaining stable voltage conditions and ensuring precise control over the trajectory and charging of targets, enhancing the stability and efficiency of target supply in EUV light generation systems.
Implementation Method 1
a discharge device configured to pump out gas inside a space defined by the cover
Implementation Method 2
an electrode provided to face the nozzle unit; a voltage generator configured to apply a voltage between the target material and the electrode
Data Source
AI summary
A target supply unit includes a nozzle unit having a through-hole to allow a target material to be outputted therethrough. A cover is provided to cover the nozzle unit, the cover having a through-hole to allow the target material to pass therethrough. A discharge device is included to pump out gas inside a space defined by the cover.