Telecentricity Manipulator for Microlithography Aberration Control
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Solution Overview
Problem
Current projection exposure systems for microlithography face challenges in controlling lithographic aberrations, particularly telecentricity, which are not adequately addressed in existing operating control systems, leading to suboptimal imaging performance and increased sensitivity to environmental disturbances.
Innovation Solution
Incorporating a dedicated telecentricity manipulator and modifying the target function to include telecentricity sensitivity, allowing for precise control of telecentricity changes through the wavefront manipulation system, using Zernike coefficients to quantify and adjust telecentricity, and implementing a control mechanism to limit manipulator adjustments based on telecentricity sensitivities.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If existing operating control systems are used without telecentricity control, then device complexity is reduced, but imaging precision deteriorates due to uncontrolled lithographic aberrations
Solution Approach 1:
A dedicated telecentricity manipulator is introduced as an intermediary device between the existing control system and the projection lens. This manipulator specifically addresses telecentricity control without requiring complete system redesign, thereby improving imaging precision while adding only the necessary level of complexity.
Solution Approach 2:
The control system is segmented into existing general control functions and a new dedicated telecentricity control module. This allows the telecentricity manipulator to operate independently, improving imaging precision for telecentricity-related aberrations without affecting other control aspects and minimizing overall system complexity.
2Manufacturing precision
If telecentricity manipulator is added to control lithographic aberrations, then imaging precision is improved, but device complexity increases
Solution Approach 1:
The telecentricity manipulator is designed to perform multiple functions: controlling telecentricity, compensating for environmental disturbances, and maintaining imaging quality across different operating conditions. This multi-functionality justifies the added complexity by delivering comprehensive precision improvements.
Solution Approach 2:
The manipulator controls imaging precision by making precise parameter changes to the projection lens characteristics, specifically adjusting telecentricity parameters. This targeted parameter control achieves imaging precision improvement with minimal additional complexity compared to broader control mechanisms.
3Reliability
If manipulator adjustments are limited based on telecentricity sensitivities, then reliability is improved by reducing environmental sensitivity, but ease of operation decreases due to additional control constraints
Solution Approach 1:
The control mechanism incorporates feedback based on telecentricity sensitivities, automatically adjusting manipulator settings to maintain optimal performance. This feedback system improves reliability by compensating for environmental disturbances without requiring complex manual adjustments, as the system self-regulates within predefined constraints.
Solution Approach 2:
Telecentricity sensitivity limits are predetermined and programmed into the control system before operation. This preliminary setup establishes reliable operating boundaries that automatically protect against environmental disturbances, improving reliability while maintaining ease of operation as users simply follow predefined guidelines.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables improved control over lithographic aberrations, specifically maintaining telecentricity within predefined specifications, reducing the impact of environmental disturbances, and ensuring high imaging quality by targeted manipulation of the projection lens.
Implementation Method 1
influencing the wavefront of the projection radiation by actuating a manipulator which has a manipulator surface arranged in the projection beam path and an actuating device for reversibly changing an optical effect of the manipulator surface
Data Source
AI summary
A projection exposure method and apparatus are disclosed for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask under the control of an operating control system of a projection exposure apparatus, part of the pattern lying in an illumination region is imaged onto the image field on the substrate with the aid of a projection lens, wherein all rays of the projection radiation contributing to the image generation in the image field form a projection beam path.