TEM Diffraction Imaging With Zero-Order Wave Mask Automation

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Solution Overview

Problem

In crystal structure analysis using a transmission electron microscope, adjusting imaging conditions to capture electron diffraction patterns is challenging due to the difficulty in distinguishing diffraction spots from intense zero-order waves, leading to blurring and inaccurate patterns, especially for beginners, and existing systems lack automatic setting capabilities for imaging conditions.

Innovation Solution

A transmission electron microscope equipped with a mask for zero-order waves that can be inserted or pulled out between the sample and detector, allowing for detection of zero-order waves and automatic adjustment of imaging conditions using current detectors and a computer to optimize exposure time and gain.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If exposure time of screen camera is increased to capture electron diffraction pattern, then diffraction pattern becomes visible, but followability of screen camera deteriorates

Engineering Contradiction:
Improvediffraction pattern detectabilityVSAvoidscreen camera followability
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The patent introduces a photodetector array as an intermediary device between the electron diffraction pattern and the screen camera. The photodetector array directly detects the electron diffraction pattern with high sensitivity and fast response, converting electron signals into electrical signals that can be processed and displayed without requiring long exposure times, thus maintaining screen camera followability while enabling diffraction pattern capture.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Measurement precision

If intensity of electron beams is increased to confirm electron diffraction pattern, then diffraction pattern becomes visible, but scintillator may be damaged

Engineering Contradiction:
Improvediffraction pattern visibilityVSAvoidscintillator damage risk
Core Design Contradiction:
Measurement precisionVSObject-affected harmful factors

Solution Approach 1:

The patent uses a photodetector array as an intermediary that directly detects electron beams without requiring conversion through a scintillator. This eliminates the need to increase electron beam intensity to a level that would damage the scintillator, as the photodetector array can detect diffraction patterns at lower, safer beam intensities.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent replaces the scintillator-based detection system with a direct electron detection system using a photodetector array. This substitution eliminates the mechanical/physical vulnerability of the scintillator to high-intensity electron beam damage while maintaining or improving detection capability.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Extent of automation

If mask for zero-order waves is not inserted, then automatic setting of imaging conditions is possible, but dose of electron beams cannot be detected

Engineering Contradiction:
Improveimaging condition automationVSAvoidelectron beam dose detection
Core Design Contradiction:
Extent of automationVSDifficulty of detecting and measuring

Solution Approach 1:

The patent designs the photodetector array to serve multiple functions: it detects both the zero-order waves (direct electron beams) and the diffracted electron beams. This multi-functionality allows the system to automatically measure electron beam dose while simultaneously capturing diffraction patterns, enabling automatic setting of imaging conditions without requiring the mask to be removed.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This setup improves operability by enabling automated adjustment of imaging conditions, reducing the complexity of capturing accurate electron diffraction patterns and preventing damage to the scintillator, making it easier for operators, including beginners, to obtain clear and precise crystal structure data.

Implementation Method 1

a mask for zero-order waves configured to be inserted into or pulled out from between a sample and the detector, and the zero-order waves are detected in a state where the mask is inserted

Methodology Applied
Scientific EffectElectron beam blocking: Absorption (EM radiation)

Implementation Method 2

a detector on which an electron diffraction pattern is projected

Methodology Applied
Scientific EffectElectron detection: Photoelectric Effect

Data Source

PatentUS12183542B2Transmission electron microscope and imaging method
Publication Date: 2024.12.31 HITACHI HIGH TECH CORP
  • US12183542B2 patent drawing
  • US12183542B2 patent drawing
  • US12183542B2 patent drawing

AI summary

The invention is to simplify operations performed when imaging an electron diffraction pattern by using a transmission electron microscope. As a solution to the problem, a transmission electron microscope includes a detector to which an electron diffraction pattern is projected, a mask for zero-order wave configured to be inserted into and pulled out from between a sample and the detector, and a current detector configured to be inserted into and pulled out from a detection region of the zero-order waves in a state where the mask is inserted. An amount of current of electron beams emitted to the mask is measured in real time, and the measurement result is automatically reflected in settings of imaging conditions of an imaging camera provided in the transmission electron microscope.