Nanoimprint Template Dummy Patterns for Resist Filling
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Solution Overview
Problem
Nanoimprint lithography processes are time-consuming due to the slow filling of resist into large concave-convex patterns, which affects throughput, as capillary phenomenon is inefficient for patterns wider than 100 nm, leading to incomplete filling or prolonged processing times.
Innovation Solution
A template with a first pattern for fine features and a second pattern for larger features, incorporating dummy patterns with a width of 100 nm or less, arranged to facilitate quicker resist filling through capillary action, and ensuring these dummy patterns are not transferred to the substrate during processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the template is pressed for a longer period of time to fill large concave-convex patterns completely, then the filling completeness is improved, but the throughput is decreased
Solution Approach 1:
The patent segments the large concave-convex pattern by introducing dummy patterns (convex or concave structures) within it, dividing the large pattern into smaller effective regions. This segmentation enables the capillary phenomenon to act more effectively across multiple smaller interfaces, accelerating resist filling without requiring extended pressing time, thus resolving the contradiction between filling completeness and throughput.
Solution Approach 2:
The dummy patterns serve as intermediary structures that facilitate resist flow into the large concave-convex pattern. By placing convex dummy patterns at the bottom of concave regions (or vice versa), the patent creates intermediate capillary pathways that guide and accelerate resist infiltration, enabling complete filling of large patterns within shorter pressing times while maintaining high throughput.
2Productivity
If the template is pressed for a shorter period of time to increase throughput, then the productivity is improved, but the large concave-convex pattern is incompletely filled
Solution Approach 1:
By segmenting the large pattern with dummy patterns, the patent creates multiple smaller capillary action zones that fill simultaneously and more rapidly. This allows the system to achieve complete filling in shorter pressing times, enabling higher throughput without sacrificing filling completeness.
Solution Approach 2:
The dummy patterns are pre-arranged within the template structure before resist application. These pre-positioned structures create immediate capillary pathways upon resist contact, initiating rapid filling action from the outset and eliminating the need for prolonged pressing times, thus enabling both high throughput and complete filling.
3Loss of time
If dummy patterns are added to facilitate quicker resist filling, then the processing time is reduced, but the device complexity increases
Solution Approach 1:
The patent applies dummy patterns selectively within specific large concave-convex regions rather than uniformly across the entire template. This localized approach introduces complexity only where necessary (in large patterns requiring accelerated filling) while leaving fine patterns unchanged, thus minimizing overall template complexity increase while achieving the time reduction benefit.
Solution Approach 2:
The template structure is segmented into functional zones: regions with fine concave-convex patterns and regions with large patterns containing dummy patterns. This segmentation allows the system to maintain simple structures where capillary filling is already effective while adding complexity only where needed, balancing processing time reduction with acceptable overall device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The template design significantly reduces the time required to fill larger concave-convex patterns with resist, enhancing processing throughput while preventing dummy patterns from affecting the final device pattern, thus maintaining efficient and accurate nanoimprint lithography.
Implementation Method 1
A capillary phenomenon is used to fill the concave-convex pattern of the template with the resist
Data Source
AI summary
According to one embodiment, there is provided a template including a first pattern, a second pattern, and a first dummy pattern. A concave-convex pattern having the width equal to 100 nm or less is arranged in the first pattern. A concave-convex pattern having the width wider than 100 nm is arranged in the second pattern. The first dummy pattern is arranged at the bottom of a concave pattern of the second pattern and made shorter than the concave-convex pattern. The first dummy pattern is arranged adjacently to another pattern at an interval equal to 100 nm or less.