Template Library for Semiconductor Mask Pattern Fidelity
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Solution Overview
Problem
The complexity of advanced optical proximity correction (OPC) processes, such as inverse lithography technology (ILT), results in time-consuming and costly formation of complex, non-linear patterns on photomasks, which increases design-to-mask cycle time and leads to pattern fidelity loss during mask fabrication and inspection.
Innovation Solution
A method and system utilizing a template library and template index to classify and define design features, allowing for efficient representation of OPC'd layouts using parameterized shape elements and affine transformations, reducing the need for fracturing patterns into overlapping rectangles and improving communication of design intent to mask writers and inspection tools.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If advanced OPC processes such as ILT are used to produce complex non-linear patterns on photomasks, then pattern fidelity and design accuracy are improved, but manufacturing time and cost increase significantly
Solution Approach 1:
The patent uses template libraries that store pre-computed pattern representations as templates. Instead of recalculating complex OPC patterns from scratch during mask fabrication, the system retrieves and applies pre-computed templates, significantly reducing the time required to transfer patterns to photomasks while maintaining pattern fidelity.
Solution Approach 2:
The system transforms complex non-linear patterns into parameterized representations using template libraries. By changing the representation from explicit pixel-by-pixel data to parameterized templates with transformation matrices, the system enables faster pattern generation while preserving the essential pattern characteristics and fidelity.
2Manufacturing precision
If complex non-linear patterns are formed on photomasks using advanced OPC, then design accuracy is improved, but the complexity of mask fabrication and inspection increases
Solution Approach 1:
The patent segments complex patterns into reusable template units stored in template libraries. Each template represents a standardized pattern element that can be independently stored, retrieved, and applied. This segmentation reduces the complexity of handling complex patterns by breaking them down into manageable, pre-processed components.
Solution Approach 2:
The template library acts as an intermediary between the design stage and mask fabrication. It pre-processes and stores pattern representations in an optimized format that facilitates easier and faster mask fabrication and inspection, reducing the computational and operational complexity during manufacturing.
3Ease of manufacture
If patterns are fractured into overlapping rectangles for mask fabrication, then compatibility with mask writing tools is improved, but pattern fidelity loss occurs
Solution Approach 1:
Instead of fracturing patterns into rectangles, the system uses template libraries to copy pre-computed pattern representations directly. This approach maintains the original pattern geometry and fidelity while ensuring compatibility with mask writing tools, as the templates are prepared in advance in the required format.
Solution Approach 2:
The system performs pattern preparation and template generation in advance during the design stage. By pre-processing patterns into template format before mask fabrication, the system ensures both pattern fidelity and mask writing compatibility without needing to fracture patterns during manufacturing.
4Manufacturing precision
If detailed OPC features are included in mask designs, then manufacturing precision is improved, but computational burden and file size increase
Solution Approach 1:
The template library stores pre-computed OPC pattern representations in an optimized format. By copying these pre-processed templates rather than recalculating them, the system maintains high manufacturing precision for OPC features while significantly reducing computational burden during mask fabrication and inspection.
Solution Approach 2:
The system transforms detailed OPC patterns into parameterized template representations. This parameterization reduces the amount of data that needs to be processed and stored, decreasing computational burden and file size while preserving the essential pattern information and manufacturing precision through the template parameters and transformation matrices.
Data Source
AI summary
A system and method that includes receiving a layout of an integrated circuit (IC) device. A template library is provided having a plurality of parameterized shape elements. A curvilinear feature of layout is classified by selecting at least one of the parameterized shape elements that defines the curvilinear feature. A template index is associated with the layout is formed that includes the selected parameterized shape element. The template index and the layout can be delivered to a mask writer, which uses the template index and the layout to fabricate a pattern on a photomask.