Template Matching Apparatus Mask Processing Area Lower Layer Interference
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Solution Overview
Problem
In semiconductor device production, patterns in lower layers may be exposed or visible during measurement, leading to a reduced degree of coincidence between templates and actual images, causing template matching failures due to the absence of lower layer pattern consideration in existing methods.
Innovation Solution
A method and apparatus that set a mask processing area on the template to exclude areas not subjected to correlation calculation, allowing for accurate matching by performing comparison processing only in designated areas, thereby maintaining high matching success rates even with partial appearances of lower layer patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If template matching is performed using conventional methods without considering lower layer patterns, then the matching process is simple and fast, but the degree of coincidence between template and actual image is reduced when lower layer patterns are visible
Solution Approach 1:
The template is divided into a first area and a second area, where the first area is used for correlation calculation and the second area is excluded from correlation calculation. This segmentation allows the matching process to focus only on relevant regions, maintaining high degree of coincidence while avoiding interference from lower layer patterns.
Solution Approach 2:
Different areas of the template are assigned different functions: the first area participates in correlation calculation while the second area is excluded. This local differentiation enables the system to maintain high matching reliability in critical areas while ignoring regions where lower layer patterns may cause interference.
2Measurement precision
If the entire template area is used for correlation calculation, then the matching process is comprehensive, but matching accuracy is reduced when lower layer patterns appear in the image
Solution Approach 1:
The second area, which is likely to contain interference from lower layer patterns, is extracted and excluded from correlation calculation. This removes the harmful factor of lower layer interference while preserving the matching accuracy in the first area where the upper layer patterns are clearly defined.
Solution Approach 2:
The presence of lower layer patterns, which would normally degrade matching accuracy, is addressed by strategically excluding specific areas from correlation calculation. This converts the potential harm of lower layer visibility into a manageable parameter by defining clear boundaries for area exclusion.
3Productivity
If mask processing areas are set to exclude regions with lower layer patterns, then matching success rate is maintained high, but the template processing becomes more complex
Solution Approach 1:
The first area and second area are predetermined and defined before the template matching process begins. This preliminary segmentation ensures that the exclusion of lower layer pattern regions is already in place, allowing the matching process to proceed efficiently without complex real-time adjustments while maintaining high success rate.
Data Source
AI summary
Provided is a template matching method and a template matching apparatus, where the degree of matching between a template and the actual image upon template matching is maintained at a high level, without depending on a partial appearance of a lower layer. Proposed as one embodiment, is a method and an apparatus for template matching, where either an area is set in which comparison of the template and the image is not conducted, or a second area is set inside the template where comparison different from comparison conducted in a first comparison area is to be conducted, and the template matching is conducted on the basis either of comparison excluding the non-comparison area, or of comparison using the first and second areas.