Imprinting Template Side Surface Resist Adhesion Prevention

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Solution Overview

Problem

In the imprinting process for semiconductor manufacturing, the resist material tends to extrude and adhere to the side surfaces of the template, leading to defects when the template is repeatedly pressed against the resist, as the resist climbs up the side surfaces and eventually falls onto the wafer at unintended times.

Innovation Solution

A protective layer with a higher contact angle than the template material is applied to the side surfaces of the template, specifically a fluorocarbon layer, to prevent resist adhesion and deformation, and a shielding plate or cushioning member is used to protect the uneven pattern during the application of this layer, ensuring the resist repellent layer is formed only on the side surfaces without affecting the pattern.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the template is repeatedly pressed against the resist to form patterns, then the productivity increases, but the resist adheres to the side surface of the mesa portion and eventually causes defects

Engineering Contradiction:
Improvenumber of repeated imprinting processesVSAvoiddefect-free pattern transfer
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

A protective layer is formed on the side surface of the mesa portion before the imprinting process begins. This preliminary protective coating prevents resist adhesion from the outset, allowing repeated imprinting cycles without defect accumulation. The protective layer is applied in advance to eliminate the harmful adhesion effect before it can occur during production.

Inventive Principle:
Principle #10Preliminary action

2Manufacturing precision

If the template is pressed firmly against the resist to ensure pattern transfer, then the manufacturing precision improves, but the resist extrudes and climbs up the side surface of the mesa portion

Engineering Contradiction:
Improvepattern transfer accuracyVSAvoidresist extrusion and climbing
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

A protective layer acts as an intermediary substance between the resist and the side surface of the mesa portion. This intermediate layer has low adhesion to resist materials, preventing resist climbing while allowing the imprinting process to proceed. The protective layer mediates the interaction between template and resist, eliminating the harmful climbing effect without compromising pattern transfer quality.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Device complexity

If the template side surface is left untreated to maintain simplicity, then the device complexity is reduced, but the resist adheres to the side surface and reduces template durability

Engineering Contradiction:
Improvetemplate structure simplicityVSAvoidtemplate service life
Core Design Contradiction:
Device complexityVSDuration of action of stationary object

Solution Approach 1:

The surface energy parameters of the template side surface are modified by applying a protective layer with specific adhesion characteristics. This parameter change creates a surface that is non-adhesive to resist materials while maintaining the overall simplicity of the template structure. The protective layer changes the surface properties without fundamentally altering the template design.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution effectively prevents resist adhesion to the template side surfaces, reducing defect occurrence in semiconductor manufacturing by ensuring consistent pattern transfer and extending the template's durability through repeated use.

Implementation Method 1

a protective layer on a side surface of the protruded portion, and having a contact angle higher with respect to a resist material than a contact angle of the protruded portion with respect to the resist material

Methodology Applied
Scientific EffectContact angle effect: Wetting

Data Source

PatentUS10359697B2Imprinting template substrate, method for manufacturing the same, imprinting template substrate manufacturing apparatus, and method for manufacturing semiconductor apparatus
Publication Date: 2019.07.23 KIOXIA CORP
  • US10359697B2 patent drawing
  • US10359697B2 patent drawing
  • US10359697B2 patent drawing

AI summary

An imprinting template substrate has a protruded portion, and a protective layer on a side surface of the protruded portion, and having a contact angle higher with respect to a resist material than a contact angle of the protruded portion with respect to the resist material. Even when the template is pressed to the resist, the resist hardly adheres to the side surface of the template. An imprinting process using the present template forms a pattern on a semiconductor substrate and then a semiconductor apparatus is manufactured.